Presentation 2003/12/12
Effects of Film Thickness on Nanoindentation Characteristics of Carbon Thin Films
Takanori HOSONO, Satoru NONOMIYA, Kensuke KANEKO, Issaku TANAKA, Shigeru UMEMURA, Shigeru HIRONO,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) To establish hardness evaluation methods for ultrathin films by nanoindentation, we deposited the carbon films of various thickness onto silicon substrates by RF sputtering and conducted the nanoindentation measurements of the films. The hardness data of the carbon films below 100 nm thickness were convolution of the inherent hardness oi the films and that of the substrate. Effects of the films thickness on the load-displacement curves in nanoindentation measurements were discussed.
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Keyword(in English) Nanoindentation / Thin film / Carbon films Hardness / AFM
Paper # EMD2003-92
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Committee EMD
Conference Date 2003/12/12(1days)
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Registration To Electromechanical Devices (EMD)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Effects of Film Thickness on Nanoindentation Characteristics of Carbon Thin Films
Sub Title (in English)
Keyword(1) Nanoindentation
Keyword(2) Thin film
Keyword(3) Carbon films Hardness
Keyword(4) AFM
1st Author's Name Takanori HOSONO
1st Author's Affiliation Chiba Institute of Technology()
2nd Author's Name Satoru NONOMIYA
2nd Author's Affiliation Chiba Institute of Technology
3rd Author's Name Kensuke KANEKO
3rd Author's Affiliation Chiba Institute of Technology
4th Author's Name Issaku TANAKA
4th Author's Affiliation Chiba Institute of Technology
5th Author's Name Shigeru UMEMURA
5th Author's Affiliation Chiba Institute of Technology
6th Author's Name Shigeru HIRONO
6th Author's Affiliation NTT AFTY Corporation
Date 2003/12/12
Paper # EMD2003-92
Volume (vol) vol.103
Number (no) 532
Page pp.pp.-
#Pages 4
Date of Issue