Presentation | 2002/12/13 Structure, mechanical and electrical properties of ECR sputtered carbon films Isamu UESAKA, Tomokazu YAJIMA, Hiromichi YOSHIZAWA, Shigeru UMEMURA, Shigeru HIRONO, Reizo KANEKO, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Carbon films were deposited onto silicon substrates by ECR spattering in argon plasma. The electric conductivity of the deposited films decreased and the wear durability of the films improved with increasing bias voltage. When the bias voltage exceeded -80V, the electric conductivity of the films increased and the wear durability degraded. These characteristics of the films were attributed to the change of sp^2 bonding versus sp^3 bonding ratio in the deposited films. We also deposited the carbon films by ECR spattering in argon-oxygen mixture plasma and found that the sp^2/sp^3 ratio of the films depends on the oxygen concentration in the argon-oxygen mixture plasma. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | carbon / AFM / ECR sputtering / thin film / sp^2 / sp^3 |
Paper # | EMD2002-94 |
Date of Issue |
Conference Information | |
Committee | EMD |
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Conference Date | 2002/12/13(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
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Paper Information | |
Registration To | Electromechanical Devices (EMD) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Structure, mechanical and electrical properties of ECR sputtered carbon films |
Sub Title (in English) | |
Keyword(1) | carbon |
Keyword(2) | AFM |
Keyword(3) | ECR sputtering |
Keyword(4) | thin film |
Keyword(5) | sp^2 |
Keyword(6) | sp^3 |
1st Author's Name | Isamu UESAKA |
1st Author's Affiliation | Chiba Institute of Technology() |
2nd Author's Name | Tomokazu YAJIMA |
2nd Author's Affiliation | Chiba Institute of Technology |
3rd Author's Name | Hiromichi YOSHIZAWA |
3rd Author's Affiliation | Chiba Institute of Technology |
4th Author's Name | Shigeru UMEMURA |
4th Author's Affiliation | Chiba Institute of Technology |
5th Author's Name | Shigeru HIRONO |
5th Author's Affiliation | NTT AFTY Corporation |
6th Author's Name | Reizo KANEKO |
6th Author's Affiliation | Faculty of Systems Engineering, Wakayama University |
Date | 2002/12/13 |
Paper # | EMD2002-94 |
Volume (vol) | vol.102 |
Number (no) | 539 |
Page | pp.pp.- |
#Pages | 4 |
Date of Issue |