Presentation 2002/12/13
Structure, mechanical and electrical properties of ECR sputtered carbon films
Isamu UESAKA, Tomokazu YAJIMA, Hiromichi YOSHIZAWA, Shigeru UMEMURA, Shigeru HIRONO, Reizo KANEKO,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) Carbon films were deposited onto silicon substrates by ECR spattering in argon plasma. The electric conductivity of the deposited films decreased and the wear durability of the films improved with increasing bias voltage. When the bias voltage exceeded -80V, the electric conductivity of the films increased and the wear durability degraded. These characteristics of the films were attributed to the change of sp^2 bonding versus sp^3 bonding ratio in the deposited films. We also deposited the carbon films by ECR spattering in argon-oxygen mixture plasma and found that the sp^2/sp^3 ratio of the films depends on the oxygen concentration in the argon-oxygen mixture plasma.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) carbon / AFM / ECR sputtering / thin film / sp^2 / sp^3
Paper # EMD2002-94
Date of Issue

Conference Information
Committee EMD
Conference Date 2002/12/13(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Electromechanical Devices (EMD)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Structure, mechanical and electrical properties of ECR sputtered carbon films
Sub Title (in English)
Keyword(1) carbon
Keyword(2) AFM
Keyword(3) ECR sputtering
Keyword(4) thin film
Keyword(5) sp^2
Keyword(6) sp^3
1st Author's Name Isamu UESAKA
1st Author's Affiliation Chiba Institute of Technology()
2nd Author's Name Tomokazu YAJIMA
2nd Author's Affiliation Chiba Institute of Technology
3rd Author's Name Hiromichi YOSHIZAWA
3rd Author's Affiliation Chiba Institute of Technology
4th Author's Name Shigeru UMEMURA
4th Author's Affiliation Chiba Institute of Technology
5th Author's Name Shigeru HIRONO
5th Author's Affiliation NTT AFTY Corporation
6th Author's Name Reizo KANEKO
6th Author's Affiliation Faculty of Systems Engineering, Wakayama University
Date 2002/12/13
Paper # EMD2002-94
Volume (vol) vol.102
Number (no) 539
Page pp.pp.-
#Pages 4
Date of Issue