Presentation 2003/7/21
Outlier Rejection in alignment for Lithography : An appreciation of Mixture Models
Shinichi NAKAJIMA, Yuho KANAYA, Nobutaka MAGOME,
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Abstract(in English) Exposure tools such as Stepper and Scanner are the key component for lithography area of semi-conductor device manufacturing. The overlay measurement desires very high accuracy according to the development of device shrinkage then outlier in measurement becomes an important issue. This report introduces an algorithm utilizing normal mixture models to reduce the influence of outliers. The Maximum Penalized Likelihood (MPL) method is also used to determine the freedom of the models minimizing the rework ratio in the production field.
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Keyword(in English) Lithography / Alignment / Outlier Rejection / Mixture Models / Maximum Penalized Likelihood
Paper # NC2003-32
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Committee NC
Conference Date 2003/7/21(1days)
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Registration To Neurocomputing (NC)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Outlier Rejection in alignment for Lithography : An appreciation of Mixture Models
Sub Title (in English)
Keyword(1) Lithography
Keyword(2) Alignment
Keyword(3) Outlier Rejection
Keyword(4) Mixture Models
Keyword(5) Maximum Penalized Likelihood
1st Author's Name Shinichi NAKAJIMA
1st Author's Affiliation Tokyo Institute of Technology:Nikon Corporation()
2nd Author's Name Yuho KANAYA
2nd Author's Affiliation Nikon Corporation
3rd Author's Name Nobutaka MAGOME
3rd Author's Affiliation Nikon Corporation
Date 2003/7/21
Paper # NC2003-32
Volume (vol) vol.103
Number (no) 227
Page pp.pp.-
#Pages 6
Date of Issue