Presentation | 2003/7/21 Outlier Rejection in alignment for Lithography : An appreciation of Mixture Models Shinichi NAKAJIMA, Yuho KANAYA, Nobutaka MAGOME, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Exposure tools such as Stepper and Scanner are the key component for lithography area of semi-conductor device manufacturing. The overlay measurement desires very high accuracy according to the development of device shrinkage then outlier in measurement becomes an important issue. This report introduces an algorithm utilizing normal mixture models to reduce the influence of outliers. The Maximum Penalized Likelihood (MPL) method is also used to determine the freedom of the models minimizing the rework ratio in the production field. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Lithography / Alignment / Outlier Rejection / Mixture Models / Maximum Penalized Likelihood |
Paper # | NC2003-32 |
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Committee | NC |
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Conference Date | 2003/7/21(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Registration To | Neurocomputing (NC) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Outlier Rejection in alignment for Lithography : An appreciation of Mixture Models |
Sub Title (in English) | |
Keyword(1) | Lithography |
Keyword(2) | Alignment |
Keyword(3) | Outlier Rejection |
Keyword(4) | Mixture Models |
Keyword(5) | Maximum Penalized Likelihood |
1st Author's Name | Shinichi NAKAJIMA |
1st Author's Affiliation | Tokyo Institute of Technology:Nikon Corporation() |
2nd Author's Name | Yuho KANAYA |
2nd Author's Affiliation | Nikon Corporation |
3rd Author's Name | Nobutaka MAGOME |
3rd Author's Affiliation | Nikon Corporation |
Date | 2003/7/21 |
Paper # | NC2003-32 |
Volume (vol) | vol.103 |
Number (no) | 227 |
Page | pp.pp.- |
#Pages | 6 |
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