Presentation 2003/10/17
CPU on a Glass Substrate Using CG Silicon TFT
Bu-Yeol LEE, Yasushi KUBOTA, Shigeki IMAI, Kiyoshi KATO, Yoshiyuki KUROKAWA, Jim KOYAMA,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) For the first time, an entire CPU has been successfully fabricated on a glass substrate suitable for LCD mass production. By using the advanced CG-Silicon Thin Film Transistor (TFT) process, with a maximum processing temperature 550oC, it was possible to use Corning 1737 glass as the substrate. The fabricated 8-bit CPU contains approximately 13,000 TFTs, and occupies an area of 169 mm square. The CPU operates successfully in a system with a clock frequency of 3 MHz and a supply voltage of 5V.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) TFT / CG Silicon / CPU
Paper # DSP2003-129,ICD2003-127,IE2003-89
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Conference Information
Committee DSP
Conference Date 2003/10/17(1days)
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Paper Information
Registration To Digital Signal Processing (DSP)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) CPU on a Glass Substrate Using CG Silicon TFT
Sub Title (in English)
Keyword(1) TFT
Keyword(2) CG Silicon
Keyword(3) CPU
1st Author's Name Bu-Yeol LEE
1st Author's Affiliation Sharp Corporation()
2nd Author's Name Yasushi KUBOTA
2nd Author's Affiliation Sharp Corporation
3rd Author's Name Shigeki IMAI
3rd Author's Affiliation Sharp Corporation
4th Author's Name Kiyoshi KATO
4th Author's Affiliation Semiconductor Energy Laboratory Corporation
5th Author's Name Yoshiyuki KUROKAWA
5th Author's Affiliation Semiconductor Energy Laboratory Corporation
6th Author's Name Jim KOYAMA
6th Author's Affiliation Semiconductor Energy Laboratory Corporation
Date 2003/10/17
Paper # DSP2003-129,ICD2003-127,IE2003-89
Volume (vol) vol.103
Number (no) 380
Page pp.pp.-
#Pages 4
Date of Issue