Presentation 2003/1/20
Growth and emission property of ZnO film by hydrogen remote plasma CVD
Yoahimi SHIMIZU, Atsushi NAKAMURA, Toru AOKI, Jiro TEMMYOU,
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Abstract(in English) c-plane ZnO films were grown on a-plane sapphire substrate by remote plasma enhanced chemical vapor deposition using a diethylzinc and oxygen gas with hydrogen plasma radicals, which was generated by rf-hollow cathode jet plasma, in order to decompose the diethylzinc at low temperature. ZnO (0001) films were grown on sapphire (11-20) substrates at substrate temperature 300℃. Deep emission of PL spectra was decreased by control of H_2 and O_2 gas flow ratio.
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Keyword(in English) ZnO / MOCVD / Diethylzinc / Remote plasma
Paper # EID20002-101
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Committee EID
Conference Date 2003/1/20(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Growth and emission property of ZnO film by hydrogen remote plasma CVD
Sub Title (in English)
Keyword(1) ZnO
Keyword(2) MOCVD
Keyword(3) Diethylzinc
Keyword(4) Remote plasma
1st Author's Name Yoahimi SHIMIZU
1st Author's Affiliation Research Institute of Electronics,Shizuoka University()
2nd Author's Name Atsushi NAKAMURA
2nd Author's Affiliation Research Institute of Electronics,Shizuoka University
3rd Author's Name Toru AOKI
3rd Author's Affiliation Research Institute of Electronics,Shizuoka University
4th Author's Name Jiro TEMMYOU
4th Author's Affiliation Research Institute of Electronics,Shizuoka University
Date 2003/1/20
Paper # EID20002-101
Volume (vol) vol.102
Number (no) 600
Page pp.pp.-
#Pages 4
Date of Issue