Presentation 2002/11/15
Characterization of the Influence of Flow Quantity of Oxygen on the Magnesium Oxide Thin Film During Vacuum Deposition
Takayoshi HIRAKAWA, Sadahiro GOTO, Shuxiu ZHANG, Heiju UCHIIKE,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) The effect of Oxygen inflow during evaporation on the deposited Magnesium Oxide (MgO) thin film were studied. Several analyses were tried for searching the factor, which changes the characteristics of MgO thin films.
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Keyword(in English) Protecting Layer for ac-PDPs / Magnesium Oxide / Crystalline
Paper # EID2002-68
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Committee EID
Conference Date 2002/11/15(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Characterization of the Influence of Flow Quantity of Oxygen on the Magnesium Oxide Thin Film During Vacuum Deposition
Sub Title (in English)
Keyword(1) Protecting Layer for ac-PDPs
Keyword(2) Magnesium Oxide
Keyword(3) Crystalline
1st Author's Name Takayoshi HIRAKAWA
1st Author's Affiliation Department of Electrical and Electronic Engineering, Faculty of Science and Engineering, Saga University()
2nd Author's Name Sadahiro GOTO
2nd Author's Affiliation Department of Electrical and Electronic Engineering, Faculty of Science and Engineering, Saga University
3rd Author's Name Shuxiu ZHANG
3rd Author's Affiliation Department of Electrical and Electronic Engineering, Faculty of Science and Engineering, Saga University
4th Author's Name Heiju UCHIIKE
4th Author's Affiliation Department of Electrical and Electronic Engineering, Faculty of Science and Engineering, Saga University
Date 2002/11/15
Paper # EID2002-68
Volume (vol) vol.102
Number (no) 467
Page pp.pp.-
#Pages 4
Date of Issue