Presentation 2004/9/9
Application of Line Patterning Method for the Fabrication of Chemical Sensor
Masanori NAKAMURA, Kazuhito AOKI, Seishi KATO, Ron USAMI, Shigeru TOYAMA,
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Abstract(in English) Line Patterning Method was originally developed by MacDiarmid's group to fabricate conductive polymer pattems on transparency films. However, this method is not restricted to fabricate conductive polymers. Here, we report a glucose sensor developed on a transparency film by using modified Line Patterning Method. The sensor chip is sized 8×24mm^2, containing a glucose sensor, a reference electrode, and a counter electrode. The horizontal resolution of the pattern was better than 0.1mm. Unlike the photolithography or the screen-printing, the method seems quite useful to fabricate many sensors in small laboratories, because it does not require photo masks nor screens.
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Keyword(in English) Glucose Sensor / Transparency Film / Line Patterning Method / Electron Beam Vapor Deposition
Paper # OME2004-69
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Committee OME
Conference Date 2004/9/9(1days)
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Registration To Organic Material Electronics (OME)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Application of Line Patterning Method for the Fabrication of Chemical Sensor
Sub Title (in English)
Keyword(1) Glucose Sensor
Keyword(2) Transparency Film
Keyword(3) Line Patterning Method
Keyword(4) Electron Beam Vapor Deposition
1st Author's Name Masanori NAKAMURA
1st Author's Affiliation Toyo University()
2nd Author's Name Kazuhito AOKI
2nd Author's Affiliation Research Institute, National Rehabilitation Center
3rd Author's Name Seishi KATO
3rd Author's Affiliation Research Institute, National Rehabilitation Center
4th Author's Name Ron USAMI
4th Author's Affiliation Toyo University
5th Author's Name Shigeru TOYAMA
5th Author's Affiliation Research Institute, National Rehabilitation Center
Date 2004/9/9
Paper # OME2004-69
Volume (vol) vol.104
Number (no) 300
Page pp.pp.-
#Pages 5
Date of Issue