| Presentation | 2003/1/17 Nano-insulation Bed with using Plasma Processes Mikinori Suzuki, Shinzo Morita, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | In order to realize single electron transistor (SET) working at a room temperature, quantum dot at about 10 nmφ must be arranged with about 1 nm space. Whereas the device should be fabricated at a thickness and/or a step small than 10 nm. Nano-insulation bed technology was proposed to fulfill the above demands for the SET device process, which forms insulating layer, and conducting part on Si wafer in a barrier free condition. We analyzed nano-lithography process with using plasma graft polymerized styrene resist and spin coated polystyrene resist in order to find problems of downsizing of the lithography pattern. The ESCA measurement of the interface between the resist and the substrate revealed the chemical structure. Plasma grafted styrene had a chemical bond to the silicon substrate. But spin coated polystyrene was observed that the film condensed without the chemical bond to the substrate. For the spin coated polystyrene film at a thickness of 1nm, ESCA measurement showed a simple peak of carbon and silicon, but showed new chemical shift after E-beam treatment. These results suggested that utilization of the chemical bond between polystyrene and Si will realize new lithography process, which is considering to use for nano-insulation bed technology. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | polystyrene / plasma graft polymerized styrene / ESCA / chemical bond of interface |
| Paper # | OME2002-98 |
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| Conference Information | |
| Committee | OME |
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| Conference Date | 2003/1/17(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Vice Chair | |
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| Paper Information | |
| Registration To | Organic Material Electronics (OME) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Nano-insulation Bed with using Plasma Processes |
| Sub Title (in English) | |
| Keyword(1) | polystyrene |
| Keyword(2) | plasma graft polymerized styrene |
| Keyword(3) | ESCA |
| Keyword(4) | chemical bond of interface |
| 1st Author's Name | Mikinori Suzuki |
| 1st Author's Affiliation | Graduate School of Engineering,Nagoya University() |
| 2nd Author's Name | Shinzo Morita |
| 2nd Author's Affiliation | Graduate School of Engineering,Nagoya University |
| Date | 2003/1/17 |
| Paper # | OME2002-98 |
| Volume (vol) | vol.102 |
| Number (no) | 592 |
| Page | pp.pp.- |
| #Pages | 4 |
| Date of Issue | |