Presentation 2003/9/22
Impact of Impurity Fluctuation on Transport between metal and semiconductor
Kazuya Matsuzawa, Atsuhiro KINOSHITA, Naoki KUSUNOKI, Atsushi YAGISHITA,
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Abstract(in English) Influence of impurity fluctuation on electrical characteristics of the Schottky barrier diode and the contact resistance were investigated by using device simulation. In the case of the Schottky barrier diode, the fluctuation of currents under reverse bias depends on the impurity density and the depletion width. It was found that there are some conditions where the fluctuation becomes being maximum. In the case of the contact resistance, the tunneling currents that locally concentrate at the region with high impurity concentration become dominant and the resistance becomes lowered by the impurity fluctuation.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Impurity / fluctuation / Schottky / Contact / Simulation
Paper # VLD2003-53
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Committee VLD
Conference Date 2003/9/22(1days)
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Registration To VLSI Design Technologies (VLD)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Impact of Impurity Fluctuation on Transport between metal and semiconductor
Sub Title (in English)
Keyword(1) Impurity
Keyword(2) fluctuation
Keyword(3) Schottky
Keyword(4) Contact
Keyword(5) Simulation
1st Author's Name Kazuya Matsuzawa
1st Author's Affiliation Advanced LSI Technology Laboratory, Toshiba()
2nd Author's Name Atsuhiro KINOSHITA
2nd Author's Affiliation Advanced LSI Technology Laboratory, Toshiba
3rd Author's Name Naoki KUSUNOKI
3rd Author's Affiliation Semiconductor Company, Toshiba
4th Author's Name Atsushi YAGISHITA
4th Author's Affiliation Semiconductor Company, Toshiba
Date 2003/9/22
Paper # VLD2003-53
Volume (vol) vol.103
Number (no) 337
Page pp.pp.-
#Pages 6
Date of Issue