Presentation	2003/9/5 Estimation of Inductors Utilizing Thick Oxide Process Jun KINO, Minoru FUJISHIMA, Kazuhiro TSURUTA,
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Abstract(in English)	Reduction of inductor loss improves the performance of the circuits. Utilizing thick oxide process which has over 20μm oxide layer, we can improve the performance of inductors without reduction of inductors self-resonant frequency. We fabricated and estimated inductors with 20μm oxide layer. And we clarify the characteristics of inductors utilizing thick oxide process through the equivalent circuits model.
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Keyword(in English)	RFIC's / inductors / thick oxide process
Paper #	ICD2003-101
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Conference Information
Committee	ICD
Conference Date	2003/9/5(1days)
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Paper Information
Registration To	Integrated Circuits and Devices (ICD)
Language	JPN
Title (in Japanese)	(See Japanese page)
Sub Title (in Japanese)	(See Japanese page)
Title (in English)	Estimation of Inductors Utilizing Thick Oxide Process
Sub Title (in English)
Keyword(1)	RFIC's
Keyword(2)	inductors
Keyword(3)	thick oxide process
1st Author's Name	Jun KINO
1st Author's Affiliation	School of Engineering, The University of Tokyo()
2nd Author's Name	Minoru FUJISHIMA
2nd Author's Affiliation	School of Engineering, The University of Tokyo : School of Frontier Sciences, The University of Tokyo
3rd Author's Name	Kazuhiro TSURUTA
3rd Author's Affiliation	DENSO CORPORATION
Date	2003/9/5
Paper #	ICD2003-101
Volume (vol)	vol.103
Number (no)	299
Page	pp.pp.-
#Pages	6
Date of Issue