Presentation 2003/1/23
Development of Membrane Probe with Pyramidal Tips for LSI Testing
Susumu KASUKABE, Terutaka MORI, Takayoshi WATANABE, Yasuhiro MOTOYAMA, Yuji WADA,
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Abstract(in English) A membrane probe with pyramidal tips is developed for bare chip and wafer testing to achieve good contact properties at small probing marks on LSIs with narrow pitch. By using anisotropic etching of silicon, quadrangular pyramidal pits are formed as the cast of probe tips. By nickel plating on these pits, pyramidal tips with copper wirings are formed on the polyimide film. Afterwards, the silicon wafer cast is dissolved by etching. This membrane probe shows stable contact resistance at 0.1-0.2 Q.
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Keyword(in English) Probe / Test / LSI / Etching
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Conference Date 2003/1/23(1days)
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Registration To Integrated Circuits and Devices (ICD)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Development of Membrane Probe with Pyramidal Tips for LSI Testing
Sub Title (in English)
Keyword(1) Probe
Keyword(2) Test
Keyword(3) LSI
Keyword(4) Etching
1st Author's Name Susumu KASUKABE
1st Author's Affiliation Production Engineering Research Laboratory, Hitachi Ltd.()
2nd Author's Name Terutaka MORI
2nd Author's Affiliation Production Engineering Research Laboratory, Hitachi Ltd.
3rd Author's Name Takayoshi WATANABE
3rd Author's Affiliation Network Systems Solutions Division, Hitachi Ltd.
4th Author's Name Yasuhiro MOTOYAMA
4th Author's Affiliation Semiconductor & Integrated Circuits, Hitachi Ltd.
5th Author's Name Yuji WADA
5th Author's Affiliation Semiconductor & Integrated Circuits, Hitachi Ltd.
Date 2003/1/23
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Volume (vol) vol.102
Number (no) 622
Page pp.pp.-
#Pages 6
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