| Presentation | 2004/6/25 Fabrication of Sub-100 nm Linewidth Grating Patterns Using Nanoimprint Lithography(Session A8 Nano-Lithography)(2004 Asia-Pasific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004)) Ki-Dong Lee, Seh-Won Ahn, Jin-Sung Kim, Joo-Do Park, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Nanoimprint Lithography (NIL) is a promising technology enabling the fabrication of nanoscale patterns with low cost. In order to be a mainstream lithography NIL should overcome the current technical limitations, which will take several years. However, a state-of-the-art NIL can find a short-term application in nano-structured optical devices and bio-devices, where the multiplayer process is not required. As one of working examples of applying NIL to the nanostructured optical devices, fabrication of sub-100 nm line-width grating patterns is described in this manuscript with a particular emphasis on the nanowire polarizer. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Nanoimprint Lithography / Nano-structured Optical Devices / Nanowire Polarizer |
| Paper # | ED2004-96,SDM2004-108 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 2004/6/25(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fabrication of Sub-100 nm Linewidth Grating Patterns Using Nanoimprint Lithography(Session A8 Nano-Lithography)(2004 Asia-Pasific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004)) |
| Sub Title (in English) | |
| Keyword(1) | Nanoimprint Lithography |
| Keyword(2) | Nano-structured Optical Devices |
| Keyword(3) | Nanowire Polarizer |
| 1st Author's Name | Ki-Dong Lee |
| 1st Author's Affiliation | Devices & Materials Lab., LG Electronics Institute of Technology() |
| 2nd Author's Name | Seh-Won Ahn |
| 2nd Author's Affiliation | Devices & Materials Lab., LG Electronics Institute of Technology |
| 3rd Author's Name | Jin-Sung Kim |
| 3rd Author's Affiliation | Devices & Materials Lab., LG Electronics Institute of Technology |
| 4th Author's Name | Joo-Do Park |
| 4th Author's Affiliation | Devices & Materials Lab., LG Electronics Institute of Technology |
| Date | 2004/6/25 |
| Paper # | ED2004-96,SDM2004-108 |
| Volume (vol) | vol.104 |
| Number (no) | 157 |
| Page | pp.pp.- |
| #Pages | 4 |
| Date of Issue | |