講演名 | 2004/6/23 Red Shift due to the Cross-link and Blue Shift due to the Bond-break in Organic Materials(Session A1 Si Novel Device and Process)(2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004)) , |
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抄録(和) | |
抄録(英) | Fluorinated amorphous carbon films are organic type materials with low dielectric constant. lt is known that the origin of low dielectric constant causes the cross-link bonding structure of this film. The blue shift of the fluorinated amorphous carbon films is due to the C-C bond-break by high energy at the transition state. 0n the other hand, the red shift causes the low energy at the transition state during the deposition. The origin of the chemical shifts is peculiar interaction of the C-H bond elongation according to the neighboring condition. The red shift of the cross-link structure contains the surface effect of a weak boundary condition due to low energy distribution. Therefore, the flatness of the films also improves. |
キーワード(和) | |
キーワード(英) | Electronegative fluorine / C-H bond / Average bond enthalpy / Bond strength / Chemical Shift |
資料番号 | ED2004-52,SDM2004-64 |
発行日 |
研究会情報 | |
研究会 | SDM |
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開催期間 | 2004/6/23(から1日開催) |
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幹事氏名(和) | |
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幹事補佐氏名(和) | |
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講演論文情報詳細 | |
申込み研究会 | Silicon Device and Materials (SDM) |
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本文の言語 | ENG |
タイトル(和) | |
サブタイトル(和) | |
タイトル(英) | Red Shift due to the Cross-link and Blue Shift due to the Bond-break in Organic Materials(Session A1 Si Novel Device and Process)(2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004)) |
サブタイトル(和) | |
キーワード(1)(和/英) | / Electronegative fluorine |
第 1 著者 氏名(和/英) | / Teresa OH |
第 1 著者 所属(和/英) | Research Institute of Advanced Technology, Faculty of Electrical and Electronic Engineering, Cheju National University |
発表年月日 | 2004/6/23 |
資料番号 | ED2004-52,SDM2004-64 |
巻番号(vol) | vol.104 |
号番号(no) | 155 |
ページ範囲 | pp.- |
ページ数 | 4 |
発行日 |