| Presentation | 2003/12/12 [Invited Paper] Low Temperature Gate Dielectrics for Organic Thin-Film Transistors on Plastic Substrates Prakaipetch Punchaipetch, Gaurang Pant, Robert M. Wallace, Bruce E. Gnade, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | The physical and electrical properties of hafnium silicate (HfSi_xO) films produced by low temperature processing conditions (〓150°C) suitable for flexible display applications were studied using sputter deposition and ultraviolet generated ozone treatments. Films with no detectable low-κ interfacial layer were produced. Rutherford Backscattering Spectroscopy (RBS), X-ray Photoelectron Spectroscopy (XPS), and High Resolution Transmission Electron Microscopy (HR-TEM) were used to determine the composition, chemical bonding environment, thickness, and film interface. The electrical behavior of the as-deposited and annealed silicate films were determined by current-voltage (I-V) and capacitance-voltage (C-V) easurements. The electrical performance of the Organic Thin Film Transistors (OTFTs) prepared by the low temperature processing HfSi_xO_y gate oxide will also be reported. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | High-κ gate dielectrics / hafnium silicate / stacked structure gate oxide / organic thin film transistors |
| Paper # | SDM2003-179(2003-12) |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 2003/12/12(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | [Invited Paper] Low Temperature Gate Dielectrics for Organic Thin-Film Transistors on Plastic Substrates |
| Sub Title (in English) | |
| Keyword(1) | High-κ gate dielectrics |
| Keyword(2) | hafnium silicate |
| Keyword(3) | stacked structure gate oxide |
| Keyword(4) | organic thin film transistors |
| 1st Author's Name | Prakaipetch Punchaipetch |
| 1st Author's Affiliation | Department of Materials Science, University of North Texas Denton() |
| 2nd Author's Name | Gaurang Pant |
| 2nd Author's Affiliation | Department of Materials Science, University of North Texas Denton |
| 3rd Author's Name | Robert M. Wallace |
| 3rd Author's Affiliation | Department of Materials Science, University of North Texas Denton |
| 4th Author's Name | Bruce E. Gnade |
| 4th Author's Affiliation | Department of Materials Science, University of North Texas Denton |
| Date | 2003/12/12 |
| Paper # | SDM2003-179(2003-12) |
| Volume (vol) | vol.103 |
| Number (no) | 533 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |