Presentation | 2003/1/31 Fabrication of Low Dielectric Porous Diamond Film Composed of Diamond Nano-particles Hiroyuki SAKAUE, Sachiko ISHIKAWA, Hiroyuki TOMIMOTO, Shoso SHINGUBARA, Takayuki TAKAHAGI, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | The reduction of the dielectric constant of inter-layer insulating films in ULSI is an important factor in improving RC delay. A "porous diamond" film, composed of nano-scale diamond particles, is proposed as a material with a low dielectric constant. Spin-coating a 5% diamond colloidal solution that was prepared by mixing diamond nano-particles in purified water successfully formed a porous diamond film. The mechanical strength and adhesion of the porous diamond film were improved by forming the chemical bonds between diamond nano-particles and also between the nano-particles and the substrate. The chemical bonds were created by introducing a bi-functional silane coupler. A relative dielectric constant of 2.48 was obtained using high purity diamond nano-particles after the reinforcing process. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | low dielectric constant / porous diamond / nano-particle / silane coupler |
Paper # | SDM2002-237 |
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Conference Information | |
Committee | SDM |
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Conference Date | 2003/1/31(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Silicon Device and Materials (SDM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Fabrication of Low Dielectric Porous Diamond Film Composed of Diamond Nano-particles |
Sub Title (in English) | |
Keyword(1) | low dielectric constant |
Keyword(2) | porous diamond |
Keyword(3) | nano-particle |
Keyword(4) | silane coupler |
1st Author's Name | Hiroyuki SAKAUE |
1st Author's Affiliation | Graduate School of ADSM, Hiroshima Univ.() |
2nd Author's Name | Sachiko ISHIKAWA |
2nd Author's Affiliation | Daiken Chemical Co., Ltd |
3rd Author's Name | Hiroyuki TOMIMOTO |
3rd Author's Affiliation | JST innovation plaza Hiroshima |
4th Author's Name | Shoso SHINGUBARA |
4th Author's Affiliation | Graduate School of ADSM, Hiroshima Univ. |
5th Author's Name | Takayuki TAKAHAGI |
5th Author's Affiliation | Graduate School of ADSM, Hiroshima Univ. |
Date | 2003/1/31 |
Paper # | SDM2002-237 |
Volume (vol) | vol.102 |
Number (no) | 637 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |