| Presentation | 2002/11/22 Ion implantation database based on a tail function Kunihiro SUZUKI, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We propose an analytical expression for dose dependent ion-implanted impurity concentration profiles using a tail function. The lateral distribution function is also proposed combined with the tail function. We show that the tail function covers B, BF_2, P, As In, and Sb ion-implanted impurity concentration profiles over a wide conditions and established the corresponding database. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Ion implantation / database |
| Paper # | SDM2002-205 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 2002/11/22(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Ion implantation database based on a tail function |
| Sub Title (in English) | |
| Keyword(1) | Ion implantation |
| Keyword(2) | database |
| 1st Author's Name | Kunihiro SUZUKI |
| 1st Author's Affiliation | Fujitsu Laboratories Ltd.() |
| Date | 2002/11/22 |
| Paper # | SDM2002-205 |
| Volume (vol) | vol.102 |
| Number (no) | 489 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |