| Presentation | 2004/2/6 Ar ion milling process for fabricating CoCrPt patterned media using a artificially assisted self-assembled PS-PMMA diblock copolymer mask Yoshiyuki KAMATA, Akira KIKITSU, Hiroyuki HIEDA, Masatoshi SAKURAI, Koji ASAKAWA, Seiji MORITA, Katsuyuki NAITO, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Etching damage of a patterned media fabricated with an artificially assisted self-assembled mask is estimated. CoCrPt thin films were etched by ion milling into aligned dots with diameter of 40nm. The milling condition was optimized for reducing the etching damage. As a result, damage to crystal lattice and crystal orientation was estimated to be slight by TEM and SEM analyses. Though strong perpendicular anisotropy was induced by the patterning process, magnetic measurements and LLG simulation revealed that the magnetic anisotropy energy was almost unchanged through this etching process. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Nanoimprint / Self-assembly / Diblock copolymer / Ar ion milling |
| Paper # | MR2003-57 |
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| Conference Information | |
| Committee | MR |
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| Conference Date | 2004/2/6(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
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| Assistant | |
| Paper Information | |
| Registration To | Magnetic Recording (MR) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Ar ion milling process for fabricating CoCrPt patterned media using a artificially assisted self-assembled PS-PMMA diblock copolymer mask |
| Sub Title (in English) | |
| Keyword(1) | Nanoimprint |
| Keyword(2) | Self-assembly |
| Keyword(3) | Diblock copolymer |
| Keyword(4) | Ar ion milling |
| 1st Author's Name | Yoshiyuki KAMATA |
| 1st Author's Affiliation | Corporate R&D center, Toshiba Corp() |
| 2nd Author's Name | Akira KIKITSU |
| 2nd Author's Affiliation | Corporate R&D center, Toshiba Corp |
| 3rd Author's Name | Hiroyuki HIEDA |
| 3rd Author's Affiliation | Corporate R&D center, Toshiba Corp |
| 4th Author's Name | Masatoshi SAKURAI |
| 4th Author's Affiliation | Corporate R&D center, Toshiba Corp |
| 5th Author's Name | Koji ASAKAWA |
| 5th Author's Affiliation | Corporate R&D center, Toshiba Corp |
| 6th Author's Name | Seiji MORITA |
| 6th Author's Affiliation | Corporate R&D center, Toshiba Corp |
| 7th Author's Name | Katsuyuki NAITO |
| 7th Author's Affiliation | Corporate R&D center, Toshiba Corp |
| Date | 2004/2/6 |
| Paper # | MR2003-57 |
| Volume (vol) | vol.103 |
| Number (no) | 654 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |