Presentation 2002/10/31
Low Temperature Sputter-Deposition of Ni-Zn Ferrite Thin-Films Using Electron-Cyclotron-Resonance Microwave Plasma : Soft Magnetic Backlayer for Spinel Ferrite Thin-Film Perpendicular Magnetic Recording Media
Hirofumi WADA, Setsuo YAMAMOTO, Hiroki KURISU, Mitsuru MATSUURA, Yoshihiro SHIMOSATO,
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Abstract(in English) A novel reactive sputtering method using an Electron-Cyclotron-Resonance (ECR) microwave plasma was used to deposit Ni-Zn ferrite thin-films for a soft magnetic backlayer of Co-containing spinel ferrite thin-film perpendicular magnetic recording media. To achieve high deposition rate, configuration of sputtering target, position of oxygen gas inlet and processing parameters such as microwave input power, target voltage, oxygen partial pressure were carefully optimized. Ni-Zn spinel ferrite thin-films with preferential orientation of (400) and relatively low coercivity of 15 Oe were obtained at a high deposition rate of 14 nm/min and at a temperatures lower than 200 degrees C. The reactive ECR sputtering is one of the most suitable preparation methods of ferrite thin-films applicable to the perpendicular magnetic recording media.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Ni-Zn ferrite thin-films / Reactive ECR sputtering / Perpendicular recording / Recording media
Paper # MR 2002-38
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Committee MR
Conference Date 2002/10/31(1days)
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Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Low Temperature Sputter-Deposition of Ni-Zn Ferrite Thin-Films Using Electron-Cyclotron-Resonance Microwave Plasma : Soft Magnetic Backlayer for Spinel Ferrite Thin-Film Perpendicular Magnetic Recording Media
Sub Title (in English)
Keyword(1) Ni-Zn ferrite thin-films
Keyword(2) Reactive ECR sputtering
Keyword(3) Perpendicular recording
Keyword(4) Recording media
1st Author's Name Hirofumi WADA
1st Author's Affiliation Faculty of Engineering, Yamaguchi University()
2nd Author's Name Setsuo YAMAMOTO
2nd Author's Affiliation Faculty of Engineering, Yamaguchi University
3rd Author's Name Hiroki KURISU
3rd Author's Affiliation Faculty of Engineering, Yamaguchi University
4th Author's Name Mitsuru MATSUURA
4th Author's Affiliation Faculty of Engineering, Yamaguchi University
5th Author's Name Yoshihiro SHIMOSATO
5th Author's Affiliation SHIMADZU Corporation
Date 2002/10/31
Paper # MR 2002-38
Volume (vol) vol.102
Number (no) 423
Page pp.pp.-
#Pages 5
Date of Issue