Presentation 2002/9/26
High performance specular spin-valve films with an FeCo-based ultrathin oxide layer by ion-assisted oxidation
Hideaki FUKUZAWA, Hitoshi IWASAKI, Masashi SAHASHI,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) We compared specular spin-valve films with an Fe^<50>Co^<50> nano-oxide layer(NOL) and a Co^<90>Fe^<10> NOL in a pinned layer,prepared by natural oxidation and ion-assisted oxidation(IAO).With small oxygen exposures during the oxidation for the Fe^<50>Co^<50>NOL by IAO,good ferromagnetic coupling through the NOL and high specularity at the NOL interface were concurrently obtained.On the other hand,natural oxidation did not cause large MR enhancement for either the Co^<90>Fe^<10> or Fe^<50>Co^<50>NOLs,and the Co^<90>Fe^<10> NOL by IAO caused weak magnetic coupling through the NOL,resulting in a small MR ratio.The Fe^<50>Co^<50>NOL for small oxygen exposures is a good candidate for a final specular spin-valve film head for 100-Giga-bit per square inch recording.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GMR / Spin-valve / Specular / Ion-assisted oxidation(IAO) / FeCo / Nano-Oxide layer(NOL)
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Committee MR
Conference Date 2002/9/26(1days)
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Registration To Magnetic Recording (MR)
Language JPN
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Title (in English) High performance specular spin-valve films with an FeCo-based ultrathin oxide layer by ion-assisted oxidation
Sub Title (in English)
Keyword(1) GMR
Keyword(2) Spin-valve
Keyword(3) Specular
Keyword(4) Ion-assisted oxidation(IAO)
Keyword(5) FeCo
Keyword(6) Nano-Oxide layer(NOL)
1st Author's Name Hideaki FUKUZAWA
1st Author's Affiliation R & D Center,Toshiba Corporation()
2nd Author's Name Hitoshi IWASAKI
2nd Author's Affiliation R & D Center,Toshiba Corporation
3rd Author's Name Masashi SAHASHI
3rd Author's Affiliation R & D Center,Toshiba Corporation
Date 2002/9/26
Paper #
Volume (vol) vol.102
Number (no) 355
Page pp.pp.-
#Pages 6
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