| Presentation | 2004/6/25 Key Technology Development for EUVL Mask Fabrication(Session A8 Nano-Lithography)(2004 Asia-Pasific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004)) Jinho Ahn, Taegeun Kim, Seungyoon Lee, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | For the successful implementation of EUV lithography technology, defect-free high-reflectivity mask fabrication is one of the key issues. Due to the unique absorbing characteristics of EUV wavelength, EUV lithography system adopts reflective optics and the multilayer structure with half-wavelength period is the only possible reflecting solution. But this multilayer structure causes several technical burdens in many processing steps including deposition, defect inspection, defect repair and cleaning. This paper presents the research results related to these critical issues. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Extreme Ultraviolet / Lithography / Mask / Multipayer / Defect |
| Paper # | ED2004-94,SDM2004-106 |
| Date of Issue |
| Conference Information | |
| Committee | ED |
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| Conference Date | 2004/6/25(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
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| Vice Chair | |
| Secretary | |
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| Paper Information | |
| Registration To | Electron Devices (ED) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Key Technology Development for EUVL Mask Fabrication(Session A8 Nano-Lithography)(2004 Asia-Pasific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004)) |
| Sub Title (in English) | |
| Keyword(1) | Extreme Ultraviolet |
| Keyword(2) | Lithography |
| Keyword(3) | Mask |
| Keyword(4) | Multipayer |
| Keyword(5) | Defect |
| 1st Author's Name | Jinho Ahn |
| 1st Author's Affiliation | Materials Science and Engineering, Hanyang University() |
| 2nd Author's Name | Taegeun Kim |
| 2nd Author's Affiliation | Materials Science and Engineering, Hanyang University |
| 3rd Author's Name | Seungyoon Lee |
| 3rd Author's Affiliation | currently with Himeji Institute of Technology |
| Date | 2004/6/25 |
| Paper # | ED2004-94,SDM2004-106 |
| Volume (vol) | vol.104 |
| Number (no) | 154 |
| Page | pp.pp.- |
| #Pages | 4 |
| Date of Issue | |