Presentation | 2004/1/12 A High Power SPOT Switch 1C using AlGaN/GaN HFETs Hidetoshi ISHIDA, Yutaka HIROSE, Atsuhiko KANDA, Tomohiro MURATA, Yoshito IKEDA, Toshinobu MATSUNO, Kaoru INOUE, Yasuhiro UEMOTO, Tsuyoshi TANAKA, Takashi EGAWA, Daisuke UEDA, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | A high power SPDT switch 1C using AlGaN/GaN HFETs was demonstrated for the first time. The reduction of on-resistance (Ron) and off-capacitance (Cofif) are necessary to realize GaN switch 1C. A novel Si-doping technique was employed to reduce ohmic contact resistance, which leads to reduction of Ron. Al_2O_3 substrates were adopted to reduce Coff. A GaN SPDT switch 1C with single-stage configuration was designed by using a circuit simulator based on the extracted device parameters. The fabricated SPDT switch 1C showed insertion loss of 0.26dB and isolation of 27dB at 1 GHz. An extremely high power handling capability of 43 W was achieved, which is 10 times higher than that of typical GaAs switch ICs. The chip size was reduced to 40% as compared to typical GaAs switch ICs due to the single-stage circuit configuration. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | GaN / FET / switch / loss / isolation / high power / Al_2O_3 |
Paper # | ED2003-201 |
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Committee | ED |
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Conference Date | 2004/1/12(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Electron Devices (ED) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | A High Power SPOT Switch 1C using AlGaN/GaN HFETs |
Sub Title (in English) | |
Keyword(1) | GaN |
Keyword(2) | FET |
Keyword(3) | switch |
Keyword(4) | loss |
Keyword(5) | isolation |
Keyword(6) | high power |
Keyword(7) | Al_2O_3 |
1st Author's Name | Hidetoshi ISHIDA |
1st Author's Affiliation | Semiconductor Research Laboratory, Matsushita Electric Industrial Co., Ltd.() |
2nd Author's Name | Yutaka HIROSE |
2nd Author's Affiliation | Semiconductor Research Laboratory, Matsushita Electric Industrial Co., Ltd. |
3rd Author's Name | Atsuhiko KANDA |
3rd Author's Affiliation | Semiconductor Research Laboratory, Matsushita Electric Industrial Co., Ltd. |
4th Author's Name | Tomohiro MURATA |
4th Author's Affiliation | Semiconductor Research Laboratory, Matsushita Electric Industrial Co., Ltd. |
5th Author's Name | Yoshito IKEDA |
5th Author's Affiliation | Semiconductor Research Laboratory, Matsushita Electric Industrial Co., Ltd. |
6th Author's Name | Toshinobu MATSUNO |
6th Author's Affiliation | Semiconductor Research Laboratory, Matsushita Electric Industrial Co., Ltd. |
7th Author's Name | Kaoru INOUE |
7th Author's Affiliation | Semiconductor Research Laboratory, Matsushita Electric Industrial Co., Ltd. |
8th Author's Name | Yasuhiro UEMOTO |
8th Author's Affiliation | Semiconductor Research Laboratory, Matsushita Electric Industrial Co., Ltd. |
9th Author's Name | Tsuyoshi TANAKA |
9th Author's Affiliation | Semiconductor Research Laboratory, Matsushita Electric Industrial Co., Ltd. |
10th Author's Name | Takashi EGAWA |
10th Author's Affiliation | Research Center for Micro-Structure Devices, Nagoya Institute of Technology |
11th Author's Name | Daisuke UEDA |
11th Author's Affiliation | Semiconductor Research Laboratory, Matsushita Electric Industrial Co., Ltd. |
Date | 2004/1/12 |
Paper # | ED2003-201 |
Volume (vol) | vol.103 |
Number (no) | 558 |
Page | pp.pp.- |
#Pages | 5 |
Date of Issue |