Presentation 2003/5/9
Power Amplifier using Combined SiGe HBTs with and without Selectively Ion Implanted Collector
Atsuhiko KANDA, Toshinobu MATSUNO, Tsuyoshi TANAKA,
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Abstract(in English) We present a novel two-stage SiGe hetero-bipolar transistor (HBT) power amplifier (PA) in which different collector doping structures were employed for the first and second stages. In order to achieve the high gain, the selectively ion implanted collector (SIC) structure was employed for the first stage HBT, while non-SIC structure was used for the second stage HBT to achieve a high breakdown voltage. At 1.95GHz, the total PAE of 31% and a gain of 28dB with an output power (Pout) of 26dBm were obtained while the adjacent channel power ratio (ACPR) was less than-38dBc.
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Keyword(in English) SiGe HBT / Power Amplifier / Selectively ion implanted Collector / High Break down Voltage
Paper # ED2003-49
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Committee ED
Conference Date 2003/5/9(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Power Amplifier using Combined SiGe HBTs with and without Selectively Ion Implanted Collector
Sub Title (in English)
Keyword(1) SiGe HBT
Keyword(2) Power Amplifier
Keyword(3) Selectively ion implanted Collector
Keyword(4) High Break down Voltage
1st Author's Name Atsuhiko KANDA
1st Author's Affiliation Semiconductor Device Research Center, Semiconductor, Company Matsushita Electric Industrial Co., Ltd.()
2nd Author's Name Toshinobu MATSUNO
2nd Author's Affiliation Semiconductor Device Research Center, Semiconductor, Company Matsushita Electric Industrial Co., Ltd.
3rd Author's Name Tsuyoshi TANAKA
3rd Author's Affiliation Semiconductor Device Research Center, Semiconductor, Company Matsushita Electric Industrial Co., Ltd.
Date 2003/5/9
Paper # ED2003-49
Volume (vol) vol.103
Number (no) 47
Page pp.pp.-
#Pages 4
Date of Issue