Presentation 2003/6/6
Channel-Doped AlGaN/GaN Heterostructure Field-Effect Transistors with Al_2O_3/Si_3N_4 Gate Insulator
Narihiko MAEDA, Takehiko TAWARA, Tadashi SAITO, Kotaro TSUNBAKI, Naoki KOBAYASHI,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) A novel AlGaN/GaN MIS HFET has been proposed, where (1) channel doping design and (2) Al_2O_3/Si_3N_4 bi-layer gate insulator are used. A fabricated device with a gate length of 1.5 μm has exhibited a state-off-the-art current density of 1.6 A/mm and a gm of 145 mS/mm with reduced gate leakage current, suggesting that the proposed MIS HFET is promising for high-power applications.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaN / HFET / Channel Doping / MIS Structure / High Current Operation
Paper # ED2003-51
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Committee ED
Conference Date 2003/6/6(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Channel-Doped AlGaN/GaN Heterostructure Field-Effect Transistors with Al_2O_3/Si_3N_4 Gate Insulator
Sub Title (in English)
Keyword(1) GaN
Keyword(2) HFET
Keyword(3) Channel Doping
Keyword(4) MIS Structure
Keyword(5) High Current Operation
1st Author's Name Narihiko MAEDA
1st Author's Affiliation NTT Photonics Laboratories()
2nd Author's Name Takehiko TAWARA
2nd Author's Affiliation NTT Basic Research Laboratories
3rd Author's Name Tadashi SAITO
3rd Author's Affiliation NTT Basic Research Laboratories
4th Author's Name Kotaro TSUNBAKI
4th Author's Affiliation Dept. of Engineering, Toyo University
5th Author's Name Naoki KOBAYASHI
5th Author's Affiliation Dept. of Applied Physics and Chemistry, The University of Electro-Communications
Date 2003/6/6
Paper # ED2003-51
Volume (vol) vol.103
Number (no) 117
Page pp.pp.-
#Pages 4
Date of Issue