Presentation 2003/1/10
High Breakdown Electric Field for Npn-type AlGaN/InGaN/GaN Heterojunction Bipolar Transistors
Toshiki Makimoto, Kazuhide Kumakura, Naoki Kobayashi,
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Abstract(in English) Npn-type AlGaN/InGaN/GaN heterojunction bipolar transistors have been fabricated for high power application. Their common-emitter current-voltage characteristics showed a high breakdown voltage of 120 (V), corresponding to the breakdown electric field of 2.3 (MV/cm) in the collector. This value is comparable to the expected one for the wide bandgap of GaN (3.3 (MV/cm)). The cross-section transmission electron microscopy image showed that the V-shape defects in InGaN were filled with wider bandgap AlGaN layers during the emitter growth. This is considered to prevent the leakage current from the base to the collector, resulting the high breakdown electric field.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) HBT / Nitride semiconductors / p-InGaN / GaN / AlGaN / Breakdown voltage / MOVPE
Paper # ED2002-270,MW2002-157
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Committee ED
Conference Date 2003/1/10(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) High Breakdown Electric Field for Npn-type AlGaN/InGaN/GaN Heterojunction Bipolar Transistors
Sub Title (in English)
Keyword(1) HBT
Keyword(2) Nitride semiconductors
Keyword(3) p-InGaN
Keyword(4) GaN
Keyword(5) AlGaN
Keyword(6) Breakdown voltage
Keyword(7) MOVPE
1st Author's Name Toshiki Makimoto
1st Author's Affiliation NTT Basic Research Laboratories, NTT Corporation()
2nd Author's Name Kazuhide Kumakura
2nd Author's Affiliation NTT Basic Research Laboratories, NTT Corporation
3rd Author's Name Naoki Kobayashi
3rd Author's Affiliation NTT Basic Research Laboratories, NTT Corporation
Date 2003/1/10
Paper # ED2002-270,MW2002-157
Volume (vol) vol.102
Number (no) 557
Page pp.pp.-
#Pages 6
Date of Issue