Presentation 2002/10/3
Measurement of Surface-States in AlGaN/GaN HEMT with Open-Gate FET
Daigo KIKUTA, Jin-Ping AO, Yasuo OHNO,
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Abstract(in English) Interface properties between passivation films and semiconductor on AlGaN/GaN high electron mobility transistor (HEMT) was investigated with open-gate field effect transistor (FET) in which a part of the gate metal is removed. Channel conductivity was measured changing the gate voltage which electrodes are placed along the channel edges. FET without passivation film showed no cutoff while FET with SiO_2 passivation film showed a similar variation as those conventional metal gate FET. Applying different voltages on the two electrodes on each side of the channel, the conductivity is almost determined by the lower voltage electrode. Using these results, interface states properties are investigated.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) AlGaN/GaN HEMT / passivation / interface / open-gate FET / interface-state
Paper # ED2002-210
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Committee ED
Conference Date 2002/10/3(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Measurement of Surface-States in AlGaN/GaN HEMT with Open-Gate FET
Sub Title (in English)
Keyword(1) AlGaN/GaN HEMT
Keyword(2) passivation
Keyword(3) interface
Keyword(4) open-gate FET
Keyword(5) interface-state
1st Author's Name Daigo KIKUTA
1st Author's Affiliation Department of Electrical and Electronic Engineering, The University of Tokushima()
2nd Author's Name Jin-Ping AO
2nd Author's Affiliation Satellite Venture Business Laboratory, The University of Tokushima
3rd Author's Name Yasuo OHNO
3rd Author's Affiliation Department of Electrical and Electronic Engineering, The University of Tokushima
Date 2002/10/3
Paper # ED2002-210
Volume (vol) vol.102
Number (no) 363
Page pp.pp.-
#Pages 5
Date of Issue