Presentation 2004/5/7
deposition of tin sulfide films by the electrochemical method and their characterization
Kaoru Omoto, Naglaa Fathy, Masaya Ichimura,
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Abstract(in English) We deposited tin sulfide film by the electrochemical deposition (ECD) method which is able to make the thin films for solar cells with low cost and cheap equipment. We applied 3 step pulse voltage and charaterized deposited film by scanning electron microscope, Auger electron spectroscopy, X-ray diffraction, optical transmission and phtoelectrochemical measurement. By optimizing pulse voltage condition. Surface morphology was improved and the composition ratio of the film aproached stoichiometry compared with the conventional 2 step pulse.
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Keyword(in English) electrochemical deposition / tin sulfide / 3 step pulse voltage / photoelectrochemical measurement
Paper # ED2004-28,CPM2004-23,SDM2004-28
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Conference Information
Committee CPM
Conference Date 2004/5/7(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) deposition of tin sulfide films by the electrochemical method and their characterization
Sub Title (in English)
Keyword(1) electrochemical deposition
Keyword(2) tin sulfide
Keyword(3) 3 step pulse voltage
Keyword(4) photoelectrochemical measurement
1st Author's Name Kaoru Omoto
1st Author's Affiliation Nagoya Institute of Technology()
2nd Author's Name Naglaa Fathy
2nd Author's Affiliation Nagoya Institute of Technology
3rd Author's Name Masaya Ichimura
3rd Author's Affiliation Nagoya Institute of Technology
Date 2004/5/7
Paper # ED2004-28,CPM2004-23,SDM2004-28
Volume (vol) vol.104
Number (no) 42
Page pp.pp.-
#Pages 5
Date of Issue