Presentation 2004/5/7
Effect of Dot Formation in Si/SiO_2 Resonant Tunneling Structure
Yasuhiko ISHIKAWA, Kohei OSADA, Hiroya IKEDA, Michiharu TABE,
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Abstract(in English) Effect of lateral size of Si potential well on electron tunneling through Si/SiO_2 double-barrier structure was studied. In the ordinary layered structure, a negative differential conductance due to the resonant tunneling was observed. In contrast, the diodes containing Si dots as the potential well showed staircases in the I-V curve. The staircase is ascribed to the single electron tunneling (Coulomb staircase) due to the reduction of capacitance.
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Keyword(in English) Si/SiO_2 / Double-barrier structure / Si dot / Resonant tunneling / Single electron tunneling
Paper # ED2004-23,CPM2004-18,SDM2004-23
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Committee CPM
Conference Date 2004/5/7(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Effect of Dot Formation in Si/SiO_2 Resonant Tunneling Structure
Sub Title (in English)
Keyword(1) Si/SiO_2
Keyword(2) Double-barrier structure
Keyword(3) Si dot
Keyword(4) Resonant tunneling
Keyword(5) Single electron tunneling
1st Author's Name Yasuhiko ISHIKAWA
1st Author's Affiliation Research Institute of Electronics, Shizuoka University()
2nd Author's Name Kohei OSADA
2nd Author's Affiliation Research Institute of Electronics, Shizuoka University
3rd Author's Name Hiroya IKEDA
3rd Author's Affiliation Research Institute of Electronics, Shizuoka University
4th Author's Name Michiharu TABE
4th Author's Affiliation Research Institute of Electronics, Shizuoka University
Date 2004/5/7
Paper # ED2004-23,CPM2004-18,SDM2004-23
Volume (vol) vol.104
Number (no) 42
Page pp.pp.-
#Pages 6
Date of Issue