Presentation | 2003/11/3 NO_2 gas sensing properties of WO_3 sputtered film dependent on the film density Chengji JIN, Toshinari YAMAZAKI, Yashuyosi SHIRAI, Toshio KIKUTA, Noriyuki NAKATANI, Humio TAKEDA, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | In order to obtain high sensitivity to NO_2 gas, the effects of the porosity and noble metal additives (Au, Pt, Ru) were studied. WO_3 thin films have been deposited on the quartz substrates by reactive dc magnetron sputtering, and then annealed in air for 4h at 600℃. The film crystallographic structures and the surface morphologies were analyzed by XRD and AFM respectively. Sputtered Pt is used for the interdigital electrode and the gas sensing properties of WO_3 thin film to 3ppm NO_2 gas were investigated. The sensitivity is increased, as the substrate temperature decreased and the discharge gas pressure increased, while the film is porous and has a low film density. Au (0.25at.) doping and low film density causes high sensitivity. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | WO_3 / Thin film / Sputtering / Film density / NO_2 gas / Gas sensor |
Paper # | CPM2003-142 |
Date of Issue |
Conference Information | |
Committee | CPM |
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Conference Date | 2003/11/3(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
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Chair | |
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Assistant |
Paper Information | |
Registration To | Component Parts and Materials (CPM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | NO_2 gas sensing properties of WO_3 sputtered film dependent on the film density |
Sub Title (in English) | |
Keyword(1) | WO_3 |
Keyword(2) | Thin film |
Keyword(3) | Sputtering |
Keyword(4) | Film density |
Keyword(5) | NO_2 gas |
Keyword(6) | Gas sensor |
1st Author's Name | Chengji JIN |
1st Author's Affiliation | Faculty of Engineering, Toyama University() |
2nd Author's Name | Toshinari YAMAZAKI |
2nd Author's Affiliation | Faculty of Engineering, Toyama University |
3rd Author's Name | Yashuyosi SHIRAI |
3rd Author's Affiliation | Faculty of Engineering, Toyama University |
4th Author's Name | Toshio KIKUTA |
4th Author's Affiliation | Faculty of Engineering, Toyama University |
5th Author's Name | Noriyuki NAKATANI |
5th Author's Affiliation | Faculty of Engineering, Toyama University |
6th Author's Name | Humio TAKEDA |
6th Author's Affiliation | Toyama National College of Technology |
Date | 2003/11/3 |
Paper # | CPM2003-142 |
Volume (vol) | vol.103 |
Number (no) | 411 |
Page | pp.pp.- |
#Pages | 5 |
Date of Issue |