Presentation | 2003/11/3 Structure and Magnetic characteristics of Fe films deposited by ion beam sputtering with Ar bombardment process Satoshi IWATSUBO, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Ar bombardment during deposition is useful to improve the soft magnetic properties of Fe films. However, it forms the mixing layer between the film and the underlayer by the atomic collisions at initial growth process. Therefore, the technique can not use to deposit the ultra-thin films. So, to avoid the mixing, Ar bombardment after the deposition may be better treatments to improve the magnetic properties of the ultrathin Fe films. In this study, the three kinds of Fe films, without Ar bombardment [B_ |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Ar bombardment / Fe films / ion beam sputtering / magnetic properties |
Paper # | CPM2003-141 |
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Conference Information | |
Committee | CPM |
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Conference Date | 2003/11/3(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
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Paper Information | |
Registration To | Component Parts and Materials (CPM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Structure and Magnetic characteristics of Fe films deposited by ion beam sputtering with Ar bombardment process |
Sub Title (in English) | |
Keyword(1) | Ar bombardment |
Keyword(2) | Fe films |
Keyword(3) | ion beam sputtering |
Keyword(4) | magnetic properties |
1st Author's Name | Satoshi IWATSUBO |
1st Author's Affiliation | Toyama Industrial Technology Center() |
Date | 2003/11/3 |
Paper # | CPM2003-141 |
Volume (vol) | vol.103 |
Number (no) | 411 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |