Presentation 2003/11/3
Structure and Magnetic characteristics of Fe films deposited by ion beam sputtering with Ar bombardment process
Satoshi IWATSUBO,
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Abstract(in English) Ar bombardment during deposition is useful to improve the soft magnetic properties of Fe films. However, it forms the mixing layer between the film and the underlayer by the atomic collisions at initial growth process. Therefore, the technique can not use to deposit the ultra-thin films. So, to avoid the mixing, Ar bombardment after the deposition may be better treatments to improve the magnetic properties of the ultrathin Fe films. In this study, the three kinds of Fe films, without Ar bombardment [B_], with Ar bombardment during the deposition [B_] and with Ar bombardment after the deposition [B_], were deposited by dual ion beam sputtering. The relationship between the morphologies and the magnetic properties was investigated as a parameter of film thickness.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Ar bombardment / Fe films / ion beam sputtering / magnetic properties
Paper # CPM2003-141
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Committee CPM
Conference Date 2003/11/3(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Structure and Magnetic characteristics of Fe films deposited by ion beam sputtering with Ar bombardment process
Sub Title (in English)
Keyword(1) Ar bombardment
Keyword(2) Fe films
Keyword(3) ion beam sputtering
Keyword(4) magnetic properties
1st Author's Name Satoshi IWATSUBO
1st Author's Affiliation Toyama Industrial Technology Center()
Date 2003/11/3
Paper # CPM2003-141
Volume (vol) vol.103
Number (no) 411
Page pp.pp.-
#Pages 6
Date of Issue