| Presentation | 2003/7/25 Preparation of TiO_2 Films with High Photocatalytic Activities by Gas Flow Sputtering Kiyoshi ISHII, Kazunari KUROKAWA, Sachio YOSIHARA, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Titanium dioxide (TiO_2) films with photocatalytic activities were prepared by reactive gas flow sputtering (GFS). GFS is a high-pressure sputtering at about 100 Pa enabling high deposition rates, and it has characteristics between PVD and CVD. A pure Ti tube was used as the target and the oxygen gas was supplied in front of the substrate. A stable sputter-deposition was carried out at a deposition rate of 80 nm/min. The crystal structure and morphology of TiO_2 films were found to strongly depend on the flow rate of oxygen gas. Polycrystalline films composed of rutile and anatase crystallites were deposited at a low flow rate of oxygen gas less than 2 sccm, where Ar flow rate was set at 300 sccm, and amorphous films were produced at the higher flow rates of oxygen gas. Polycrystalline films showed superior photocatalytic activities, while amorphous films were not photocatalytic. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | titanium dioxide film / photocatalytic film / sputtered TiO_2 film / gas flow sputtering / reactive gas flow sputtering |
| Paper # | CPM2003-70 |
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| Conference Information | |
| Committee | CPM |
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| Conference Date | 2003/7/25(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
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| Vice Chair | |
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| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Preparation of TiO_2 Films with High Photocatalytic Activities by Gas Flow Sputtering |
| Sub Title (in English) | |
| Keyword(1) | titanium dioxide film |
| Keyword(2) | photocatalytic film |
| Keyword(3) | sputtered TiO_2 film |
| Keyword(4) | gas flow sputtering |
| Keyword(5) | reactive gas flow sputtering |
| 1st Author's Name | Kiyoshi ISHII |
| 1st Author's Affiliation | Faculty of Engineering, Utsunomiya University() |
| 2nd Author's Name | Kazunari KUROKAWA |
| 2nd Author's Affiliation | Faculty of Engineering, Utsunomiya University |
| 3rd Author's Name | Sachio YOSIHARA |
| 3rd Author's Affiliation | Graduate School of Engineering, Utsunomiya University |
| Date | 2003/7/25 |
| Paper # | CPM2003-70 |
| Volume (vol) | vol.103 |
| Number (no) | 245 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |