Presentation 2003/7/25
Growth Temperature Dependence of Atomic Level Structures at the Heterointerfaces of InP/GaInAs/InP and GaAs/GaInP/GaAs
Masao TABUCHI, Shin'ichi HISADOME, Ryo OGA, Atsushi KOIZUMI, Yasufumi FUJIWARA, Yoshikazu TAKEDA,
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Abstract(in English) The atomic level structure of semiconductor heterostructures and their growth condition dependences (including growth technique itself) were elucidated by the X-ray CTR (crystal truncation rod) scattering technique. Though the growth facilities such as MBE and OMVPE have been believed to be able to fabricate heterostructures at the atomically controlled accuracy, the real structures were quite graded and very much dependent on growth conditions. Based on the investigation on the InP/GaInAs/InP heterostructures, the origin of the intense and deep PL peak from the GaAs/GaInP/GaAs heterostuctures was proved to be the In distribution into GaAs, which forms a GaInAs quantum well at the heterointerface. The lower growth temperature suppressed the In distribution and this peak simultaneously. Thus, it is demonstrated that the X-ray CTR scattering technique is a very powerful technique to reveal the atomic level structures of quantum wells and heterointerfaces.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) X-ray CTR scattering technique / OMVPE / MBE / Heterostructures / InP-GaInAs-InP / GaAs-GaInP-GaAs
Paper # CPM2003-63
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Committee CPM
Conference Date 2003/7/25(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Growth Temperature Dependence of Atomic Level Structures at the Heterointerfaces of InP/GaInAs/InP and GaAs/GaInP/GaAs
Sub Title (in English)
Keyword(1) X-ray CTR scattering technique
Keyword(2) OMVPE
Keyword(3) MBE
Keyword(4) Heterostructures
Keyword(5) InP-GaInAs-InP
Keyword(6) GaAs-GaInP-GaAs
1st Author's Name Masao TABUCHI
1st Author's Affiliation Venture Business Laboratory, Nagoya University()
2nd Author's Name Shin'ichi HISADOME
2nd Author's Affiliation Graduate School of Engineering, Nagoya University
3rd Author's Name Ryo OGA
3rd Author's Affiliation Graduate School of Engineering, Nagoya University
4th Author's Name Atsushi KOIZUMI
4th Author's Affiliation Graduate School of Engineering, Nagoya University
5th Author's Name Yasufumi FUJIWARA
5th Author's Affiliation Graduate School of Engineering, Nagoya University
6th Author's Name Yoshikazu TAKEDA
6th Author's Affiliation Venture Business Laboratory, Nagoya University:Graduate School of Engineering, Nagoya University
Date 2003/7/25
Paper # CPM2003-63
Volume (vol) vol.103
Number (no) 245
Page pp.pp.-
#Pages 6
Date of Issue