Presentation 2003/7/25
Evaluation of Si(001)-c(4×4) structure formed using MMSi by STM
Masayuki HARASHIMA, Kanji YASUI, Tadashi AKAHANE,
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Abstract(in English) At the initial stage of 3C-SiC growth on Si(001) using organosilicon compounds such as monomethylsilane and dimethylsilane, the c(4x4) was formed before the nucleation of SiC islands. By the observation on the c(4x4) formed surface by scanning tunneling microscopy (STM), it was found that both c(4x4) domains and (2x1) domains coexisted. From the estimation of the lattice constant for these structures by lineprofile measurement, it was confirmed that the c(4x4) domain was contracted and to be preferential site for SiC nucleation. The STM observation of the c(4x4) also revealed that the c(4x4) domain consisted of α-cell and β-cell similar to the results reported so far.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Silicon carbaide / monomethylsilane / c(4x4) structure / STM
Paper # CPM2003-62
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Committee CPM
Conference Date 2003/7/25(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Evaluation of Si(001)-c(4×4) structure formed using MMSi by STM
Sub Title (in English)
Keyword(1) Silicon carbaide
Keyword(2) monomethylsilane
Keyword(3) c(4x4) structure
Keyword(4) STM
1st Author's Name Masayuki HARASHIMA
1st Author's Affiliation Department of Electrical Engineering, Nagaoka University of Technology()
2nd Author's Name Kanji YASUI
2nd Author's Affiliation Department of Electrical Engineering, Nagaoka University of Technology
3rd Author's Name Tadashi AKAHANE
3rd Author's Affiliation Department of Electrical Engineering, Nagaoka University of Technology
Date 2003/7/25
Paper # CPM2003-62
Volume (vol) vol.103
Number (no) 245
Page pp.pp.-
#Pages 6
Date of Issue