Presentation 2002/5/17
C-doped GaAsSb grown by MOCVD with CBr_4
Yasuhiro ODA, Noriyuki WATANABE, Takashi KOBAYASHI,
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Abstract(in English) We investigated influence of partial pressure of CBr_4 on growth of GaAsSb by MOCVD. Because of etching effect by CBr_4, growth rate of GaAsSb decreased as partial pressure of CBr_4 increased. Additionally, Sb content in GaAsSb also decreased. These phenomena are caused by difference between etching rate of Ga-As and Ga-Sb in GaAsSb. Next, we attempted to explain increase in hall concentration after annealing in C-doped GaAsSb. Carbon acceptors in GaAsSb may combine with hydrogens, partially, and de-active in MOCVD growth. These C-H combinations are cut by thermal energy, the carbon acceptors become re-active.
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Keyword(in English) MOCVD / GaAsSb / CBr_4 / C-doped / acceptor passivation
Paper # CPM2002-32
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Committee CPM
Conference Date 2002/5/17(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) C-doped GaAsSb grown by MOCVD with CBr_4
Sub Title (in English)
Keyword(1) MOCVD
Keyword(2) GaAsSb
Keyword(3) CBr_4
Keyword(4) C-doped
Keyword(5) acceptor passivation
1st Author's Name Yasuhiro ODA
1st Author's Affiliation NTT Photonics Laboratories Nippon Telegraph and Telephone Corporation()
2nd Author's Name Noriyuki WATANABE
2nd Author's Affiliation NTT Photonics Laboratories Nippon Telegraph and Telephone Corporation:Advanced Technology Corporation
3rd Author's Name Takashi KOBAYASHI
3rd Author's Affiliation NTT Photonics Laboratories Nippon Telegraph and Telephone Corporation
Date 2002/5/17
Paper # CPM2002-32
Volume (vol) vol.102
Number (no) 79
Page pp.pp.-
#Pages 6
Date of Issue