Presentation | 2003/1/22 Fabrication of Josephson Tunnel Junctions Using Photosensitive Polyimide Insulator Katsuya KIKUCHI, Shigemasa SEGAWA, Eun-Sil JUNG, Tomokazu OKAWA, Daisuke UMETSU, Hiroshi NAKAGAWA, Kazuhiko TOKORO, Hiroshi ITATANI, Masahiro AOYAGI, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We proposed a new fabrication process for the Josephson tunnel junction using a photosensitive polyimide. Photosensitive polyimide is composed of block copolymerized polyimide and sensitizer. By utilizing the photosensitive polyimide, fabrication process of the Josephson tunnel junction can be simplified. We fabricated Nb/Al-AlO_x/Nb Josephson tunnel junctions using this new process. As a result of observing by SEM, steep steps of the junction edges were covered smoothly by the polyimide film. The junctions show excellent current-voltage (I-V) characteristics with V_m values more than 80 mV. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Photosensitive Polyimide / Josephson Tunnel Junctions / Block Copolymerized Polyimide with Solvent Solubility |
Paper # | SCE2002-34 |
Date of Issue |
Conference Information | |
Committee | SCE |
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Conference Date | 2003/1/22(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Superconductive Electronics (SCE) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Fabrication of Josephson Tunnel Junctions Using Photosensitive Polyimide Insulator |
Sub Title (in English) | |
Keyword(1) | Photosensitive Polyimide |
Keyword(2) | Josephson Tunnel Junctions |
Keyword(3) | Block Copolymerized Polyimide with Solvent Solubility |
1st Author's Name | Katsuya KIKUCHI |
1st Author's Affiliation | NeRI,AIST() |
2nd Author's Name | Shigemasa SEGAWA |
2nd Author's Affiliation | PI R&D Co.,Ltd. |
3rd Author's Name | Eun-Sil JUNG |
3rd Author's Affiliation | NeRI,AIST |
4th Author's Name | Tomokazu OKAWA |
4th Author's Affiliation | Faculty of Engineering,Saitama Univ. |
5th Author's Name | Daisuke UMETSU |
5th Author's Affiliation | Faculty of Engineering,Chiba Inst.Tech. |
6th Author's Name | Hiroshi NAKAGAWA |
6th Author's Affiliation | NeRI,AIST |
7th Author's Name | Kazuhiko TOKORO |
7th Author's Affiliation | NeRI,AIST |
8th Author's Name | Hiroshi ITATANI |
8th Author's Affiliation | PI R&D Co.,Ltd. |
9th Author's Name | Masahiro AOYAGI |
9th Author's Affiliation | NeRI,AIST |
Date | 2003/1/22 |
Paper # | SCE2002-34 |
Volume (vol) | vol.102 |
Number (no) | 612 |
Page | pp.pp.- |
#Pages | 4 |
Date of Issue |