Presentation 2019-01-17
Surface Improvement Investigation of Sol-Gel SiO2 Cladding for Waveguide Device Passivation
Satoshi Ogawa, Ahmad Syahrin Idris, Yu Han, Haisong Jiang, Kiichi Hamamoto,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) For exploiting sol-gel SiO2 for waveguide device passivation, plasma-ashing, in addition to 700 ℃ annealing, is proposed to improve surface condition of sol-gel SiO2. Regular wet etching of SiO2 layer on Si with ratio of 1,800 nm/min and sufficient electrical insulation (>1011 Ω/cm) toward proper current induced refractive index change have been successfully confirmed.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Silicon photonics / SiO2 / Sol-Gel method / Passivation / Optical waveguides
Paper # PN2018-53,EMT2018-87,OPE2018-162,LQE2018-172,EST2018-100,MWP2018-71
Date of Issue 2019-01-10 (PN, EMT, OPE, LQE, EST, MWP)

Conference Information
Committee PN / EMT / OPE / EST / MWP / LQE / IEE-EMT
Conference Date 2019/1/17(2days)
Place (in Japanese) (See Japanese page)
Place (in English) Osaka University Nakanoshima Center
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair Hiroshi Hasegawa(Nagoya Univ.) / Akira Hirose(Univ. of Tokyo) / Kouki Sato(Furukawa Electric Industries) / Akimasa Hirata(Nagoya Inst. of Tech.) / Tetsuya Kawanishi(Waseda Univ.) / Kiichi Hamamoto(Kyusyu Univ.) / Keiji Goto(National Defense Academy)
Vice Chair Haruki Ogoshi(Furukawa Electric) / Takehiro Tsuritani(KDDI Research) / Hideaki Furukawa(NICT) / Koichi Hirayama(Kitami Inst. of Tech.) / Hiroshi Takahashi(Sophia Univ.) / Shinichiro Ohnuki(Nihon Univ.) / Masayuki Kimishima(Advantest) / Jun Shibayama(Hosei Univ.) / Naoto Yoshimoto(Chitose Inst. of Science and Tech.) / Hiroshi Aruga(Mitsubishi Electric)
Secretary Haruki Ogoshi(NICT) / Takehiro Tsuritani(Univ. of Fukui) / Hideaki Furukawa(NTT) / Koichi Hirayama(Tokyo Metro. Coll. of Tech) / Hiroshi Takahashi(Fukuoka Inst.of Tech.) / Shinichiro Ohnuki(Univ. of Tokyo) / Masayuki Kimishima(NICT) / Jun Shibayama(CIST) / Naoto Yoshimoto(National Inst. of Tech.,Sendai College) / Hiroshi Aruga(NICT) / (Chiba Inst. of Tech.)
Assistant Keijiro Suzuki(AIST) / Junichiro Sugisaka(Kitami Inst. of Tech.) / Yuya Shoji(Tokyo Inst. of Tech.) / Kazunori Seno(NTT) / Takahiro Ito(Nagoya Inst. of Tech.) / Kazuhiro Fujita(Fujitsu) / Kensuke Ikeda(CRIEPI) / Kosuke Nishimura(KDDI Research) / Masaya Nagai(Osaka Univ.) / Yoshihiro Naka(Kyushu Univ. of Health and Welfare)

Paper Information
Registration To Technical Committee on Photonic Network / Technical Committee on Electromagnetic Theory / Technical Committee on OptoElectronics / Technical Committee on Electronics Simulation Technology / Technical Committee on Microwave and Millimeter-wave Photonics / Technical Committee on Lasers and Quantum Electronics / Technical Meeting on Electromagnetic Theory
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Surface Improvement Investigation of Sol-Gel SiO2 Cladding for Waveguide Device Passivation
Sub Title (in English)
Keyword(1) Silicon photonics
Keyword(2) SiO2
Keyword(3) Sol-Gel method
Keyword(4) Passivation
Keyword(5) Optical waveguides
1st Author's Name Satoshi Ogawa
1st Author's Affiliation Kyushu University(Kyushu Univ.)
2nd Author's Name Ahmad Syahrin Idris
2nd Author's Affiliation Kyushu University(Kyushu Univ.)
3rd Author's Name Yu Han
3rd Author's Affiliation Kyushu University(Kyushu Univ.)
4th Author's Name Haisong Jiang
4th Author's Affiliation Kyushu University(Kyushu Univ.)
5th Author's Name Kiichi Hamamoto
5th Author's Affiliation Kyushu University(Kyushu Univ.)
Date 2019-01-17
Paper # PN2018-53,EMT2018-87,OPE2018-162,LQE2018-172,EST2018-100,MWP2018-71
Volume (vol) vol.118
Number (no) PN-396,EMT-397,OPE-398,LQE-399,EST-400,MWP-401
Page pp.pp.127-130(PN), pp.127-130(EMT), pp.127-130(OPE), pp.127-130(LQE), pp.127-130(EST), pp.127-130(MWP),
#Pages 4
Date of Issue 2019-01-10 (PN, EMT, OPE, LQE, EST, MWP)