| Presentation | 2019-01-17 A study of deep dry etching for Photonic Crystal CirD Laser Li Zeng, Shun Mizoguchi, Xiuyu Zhang, Kento Takeuchi, Hirotake Kajii, Masato Morifuji, Akihiro Maruta, Masahiko Kondow, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | In order to fabricate a photonic crystal laser with circular defect (CirD) resonator, we study deep dry etching of GaAs /AlGaAs epitaxial multilayers including InAs quantum dots using a resist mask. The etching is performed by inductively coupled plasma reactive ion etching using a mixture of Cl2，BCl3 and CH4 gases. When etching time is increased to fabricate deep air holes, the resist mask is completely etched and the surface is damaged. Therefore, we stack the resist layers on epi-wafer by twice spin-coating and enable deeper dry etching without damage. As a result, fabrication of air holes with a depth of 1.5μm becomes possible. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Photonic crystal / Dry etching / InAs quantum dot / GaAs / AlGaAs |
| Paper # | PN2018-35,EMT2018-69,OPE2018-144,LQE2018-154,EST2018-82,MWP2018-53 |
| Date of Issue | 2019-01-10 (PN, EMT, OPE, LQE, EST, MWP) |
| Conference Information | |
| Committee | PN / EMT / OPE / EST / MWP / LQE / IEE-EMT |
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| Conference Date | 2019/1/17(2days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Osaka University Nakanoshima Center |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | Hiroshi Hasegawa(Nagoya Univ.) / Akira Hirose(Univ. of Tokyo) / Kouki Sato(Furukawa Electric Industries) / Akimasa Hirata(Nagoya Inst. of Tech.) / Tetsuya Kawanishi(Waseda Univ.) / Kiichi Hamamoto(Kyusyu Univ.) / Keiji Goto(National Defense Academy) |
| Vice Chair | Haruki Ogoshi(Furukawa Electric) / Takehiro Tsuritani(KDDI Research) / Hideaki Furukawa(NICT) / Koichi Hirayama(Kitami Inst. of Tech.) / Hiroshi Takahashi(Sophia Univ.) / Shinichiro Ohnuki(Nihon Univ.) / Masayuki Kimishima(Advantest) / Jun Shibayama(Hosei Univ.) / Naoto Yoshimoto(Chitose Inst. of Science and Tech.) / Hiroshi Aruga(Mitsubishi Electric) |
| Secretary | Haruki Ogoshi(NICT) / Takehiro Tsuritani(Univ. of Fukui) / Hideaki Furukawa(NTT) / Koichi Hirayama(Tokyo Metro. Coll. of Tech) / Hiroshi Takahashi(Fukuoka Inst.of Tech.) / Shinichiro Ohnuki(Univ. of Tokyo) / Masayuki Kimishima(NICT) / Jun Shibayama(CIST) / Naoto Yoshimoto(National Inst. of Tech.,Sendai College) / Hiroshi Aruga(NICT) / (Chiba Inst. of Tech.) |
| Assistant | Keijiro Suzuki(AIST) / Junichiro Sugisaka(Kitami Inst. of Tech.) / Yuya Shoji(Tokyo Inst. of Tech.) / Kazunori Seno(NTT) / Takahiro Ito(Nagoya Inst. of Tech.) / Kazuhiro Fujita(Fujitsu) / Kensuke Ikeda(CRIEPI) / Kosuke Nishimura(KDDI Research) / Masaya Nagai(Osaka Univ.) / Yoshihiro Naka(Kyushu Univ. of Health and Welfare) |
| Paper Information | |
| Registration To | Technical Committee on Photonic Network / Technical Committee on Electromagnetic Theory / Technical Committee on OptoElectronics / Technical Committee on Electronics Simulation Technology / Technical Committee on Microwave and Millimeter-wave Photonics / Technical Committee on Lasers and Quantum Electronics / Technical Meeting on Electromagnetic Theory |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | A study of deep dry etching for Photonic Crystal CirD Laser |
| Sub Title (in English) | |
| Keyword(1) | Photonic crystal |
| Keyword(2) | Dry etching |
| Keyword(3) | InAs quantum dot |
| Keyword(4) | GaAs |
| Keyword(5) | AlGaAs |
| 1st Author's Name | Li Zeng |
| 1st Author's Affiliation | Osaka University(Osaka Univ.) |
| 2nd Author's Name | Shun Mizoguchi |
| 2nd Author's Affiliation | Osaka University(Osaka Univ.) |
| 3rd Author's Name | Xiuyu Zhang |
| 3rd Author's Affiliation | Osaka University(Osaka Univ.) |
| 4th Author's Name | Kento Takeuchi |
| 4th Author's Affiliation | Osaka University(Osaka Univ.) |
| 5th Author's Name | Hirotake Kajii |
| 5th Author's Affiliation | Osaka University(Osaka Univ.) |
| 6th Author's Name | Masato Morifuji |
| 6th Author's Affiliation | Osaka University(Osaka Univ.) |
| 7th Author's Name | Akihiro Maruta |
| 7th Author's Affiliation | Osaka University(Osaka Univ.) |
| 8th Author's Name | Masahiko Kondow |
| 8th Author's Affiliation | Osaka University(Osaka Univ.) |
| Date | 2019-01-17 |
| Paper # | PN2018-35,EMT2018-69,OPE2018-144,LQE2018-154,EST2018-82,MWP2018-53 |
| Volume (vol) | vol.118 |
| Number (no) | PN-396,EMT-397,OPE-398,LQE-399,EST-400,MWP-401 |
| Page | pp.pp.23-26(PN), pp.23-26(EMT), pp.23-26(OPE), pp.23-26(LQE), pp.23-26(EST), pp.23-26(MWP), |
| #Pages | 4 |
| Date of Issue | 2019-01-10 (PN, EMT, OPE, LQE, EST, MWP) |