Presentation 2018-12-18
[Invited Talk] High-Speed Performance of InP-, Sb- and GaN-based HEMTs
Akira Endoh, Issei Watanabe, Yoshimi Yamashita, Akifumi Kasamatsu, Hiroki Fujishiro, Takashi Mimura,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) We have fabricated nanometer-scale InP-, Sb- and GaN-based HEMTs by using electron beam lithography and measured their characteristics. For InP-based InGaAs/InAs/InGaAs channel HEMTs, we measured cryogenic characteristics. Cutoff frequency fT and maximum oscillation frequency fmax increase under cryogenic conditions. The extent of increase for fmax is much more than that for fT. For InSb channel HEMTs, we obtained an fT of 316 GHz by using two-step-recessed gateprocess. For GaN-based HEMTs, we proposed MIS-HEMTs with triple-layer insulators. We obtained an fT of 235 GHz for InAlN/AlN/GaN HEMTs with InAlN thickness of 3 nm and gate length of 45 nm.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) High Electron Mobility Transistor / HEMT / InP / Sb / GaN / Cutoff frequency / Maximum oscillation frequency
Paper # ED2018-62
Date of Issue 2018-12-10 (ED)

Conference Information
Committee ED
Conference Date 2018/12/17(2days)
Place (in Japanese) (See Japanese page)
Place (in English) RIEC, Tohoku Univ.
Topics (in Japanese) (See Japanese page)
Topics (in English) Millimeter-wave, terahertz-wave devices and systems
Chair Kunio Tsuda(Toshiba)
Vice Chair Michihiko Suhara(TMU)
Secretary Michihiko Suhara(NICT)
Assistant Tatsuya Iwata(TUT) / Junji Kotani(Fjitsu Lab.)

Paper Information
Registration To Technical Committee on Electron Devices
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) [Invited Talk] High-Speed Performance of InP-, Sb- and GaN-based HEMTs
Sub Title (in English)
Keyword(1) High Electron Mobility Transistor
Keyword(2) HEMT
Keyword(3) InP
Keyword(4) Sb
Keyword(5) GaN
Keyword(6) Cutoff frequency
Keyword(7) Maximum oscillation frequency
1st Author's Name Akira Endoh
1st Author's Affiliation National Institute of Information and Communications Technology(NICT)
2nd Author's Name Issei Watanabe
2nd Author's Affiliation National Institute of Information and Communications Technology(NICT)
3rd Author's Name Yoshimi Yamashita
3rd Author's Affiliation National Institute of Information and Communications Technology(NICT)
4th Author's Name Akifumi Kasamatsu
4th Author's Affiliation National Institute of Information and Communications Technology(NICT)
5th Author's Name Hiroki Fujishiro
5th Author's Affiliation Tokyo University of Science(Tokyo Univ. of Science)
6th Author's Name Takashi Mimura
6th Author's Affiliation National Institute of Information and Communications Technology(NICT)
Date 2018-12-18
Paper # ED2018-62
Volume (vol) vol.118
Number (no) ED-368
Page pp.pp.35-38(ED),
#Pages 4
Date of Issue 2018-12-10 (ED)