| Presentation | 2018-12-06 Fabrication of Er0.29Yb0.29Y1.42SiO5 waveguide amplifier Radical Assisted Sputtering Ayuko Minowa, Hideo Isshiki, Fumiya Kondow, Kodai Miyagi, Ghent Nakamura, Tomoki Kasumi, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | At present, in the field of information and communication technologies, silicon photo attracts attention. Since light attenuation occurs in silicon photonics, it is indispensable to develop a minute optical amplifying element. So far, we found the optimum composition ratio of crystals containing Er, Yb, Y, Si, O. We have fabricated and evaluated a waveguide type optical amplifier using Er_0.29Yb_0.29Y_0.42SiO_5crystal by the solgel method. In this research, we evaluate the characteristics of the Er_0.29Yb_0.29Y_0.42SiO_5 crystal by the Radical Assisted Sputtering (RAS) method, and fabricate a waveguide type optical amplifier. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Silicon photonics / Optical amplifying / Erbium |
| Paper # | OPE2018-115,LQE2018-125,SIPH2018-31 |
| Date of Issue | 2018-11-29 (OPE, LQE) |
| Conference Information | |
| Committee | LQE / OPE |
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| Conference Date | 2018/12/6(2days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Keio University |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Photonic Device Workshop |
| Chair | Kiichi Hamamoto(Kyusyu Univ.) / Kouki Sato(Furukawa Electric Industries) |
| Vice Chair | Hiroshi Aruga(Mitsubishi Electric) / Hiroshi Takahashi(Sophia Univ.) |
| Secretary | Hiroshi Aruga(SEI) / Hiroshi Takahashi(Furukawa Electric Industries) |
| Assistant | Masaya Nagai(Osaka Univ.) / Yuya Shoji(Tokyo Inst. of Tech.) / Kazunori Seno(NTT) |
| Paper Information | |
| Registration To | Technical Committee on Lasers and Quantum Electronics / Technical Committee on OptoElectronics |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fabrication of Er0.29Yb0.29Y1.42SiO5 waveguide amplifier Radical Assisted Sputtering |
| Sub Title (in English) | |
| Keyword(1) | Silicon photonics |
| Keyword(2) | Optical amplifying |
| Keyword(3) | Erbium |
| 1st Author's Name | Ayuko Minowa |
| 1st Author's Affiliation | The University of Electro-Communications(UEC) |
| 2nd Author's Name | Hideo Isshiki |
| 2nd Author's Affiliation | The University of Electro-Communications(UEC) |
| 3rd Author's Name | Fumiya Kondow |
| 3rd Author's Affiliation | The University of Electro-Communications(UEC) |
| 4th Author's Name | Kodai Miyagi |
| 4th Author's Affiliation | The University of Electro-Communications(UEC) |
| 5th Author's Name | Ghent Nakamura |
| 5th Author's Affiliation | The University of Electro-Communications(UEC) |
| 6th Author's Name | Tomoki Kasumi |
| 6th Author's Affiliation | The University of Electro-Communications(UEC) |
| Date | 2018-12-06 |
| Paper # | OPE2018-115,LQE2018-125,SIPH2018-31 |
| Volume (vol) | vol.118 |
| Number (no) | OPE-348,LQE-349,SIPH- |
| Page | pp.pp.89-92(OPE), pp.89-92(LQE), pp.89-92(SIPH), |
| #Pages | 4 |
| Date of Issue | 2018-11-29 (OPE, LQE) |