Presentation | 2018-12-07 Flip-Flops with different retention characteristics for process variation estimation Kento Fukazawa, Shinichi Nishizawa, Kazuhito Ito, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | This paper proposes to use multiple D-Flip-Flops having different retention characteristics with Ring Oscillator to monitor the PMOS and NMOS variabilities. Flip-Flops in Scan Chain are used as a process monitor circuit to estimate the amount of process variation. The retention characteristics of Flip-Flops strongly depend on the PMOS and NMOS transistors. We propose to use Flip-Flops with various transistors width to estimate the amount of process variation with one-shot measurement. Experimental result targeting 65 nm process shows that we can estimate the amount of threshold variation and the estimated errors are 1.75 mV and 1.17 mV for PMOS and NMOS transistor, respectively. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Variation / Flip-Flop |
Paper # | VLD2018-66,DC2018-52 |
Date of Issue | 2018-11-28 (VLD, DC) |
Conference Information | |
Committee | VLD / DC / CPSY / RECONF / CPM / ICD / IE / IPSJ-SLDM / IPSJ-EMB / IPSJ-ARC |
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Conference Date | 2018/12/5(3days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | Satellite Campus Hiroshima |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | Design Gaia 2018 -New Field of VLSI Design- |
Chair | Noriyuki Minegishi(Mitsubishi Electric) / Satoshi Fukumoto(Tokyo Metropolitan Univ.) / Koji Nakano(Hiroshima Univ.) / Masato Motomura(Hokkaido Univ.) / Fumihiko Hirose(Yamagata Univ.) / Hideto Hidaka(Renesas) / Takayuki Hamamoto(Tokyo Univ. of Science) / Yutaka Tamiya(Fujitsu Laboratories) / 渡辺 晴美(東海大) / 井上 弘士(九大) |
Vice Chair | Nozomu Togawa(Waseda Univ.) / Hiroshi Takahashi(Ehime Univ.) / Hidetsugu Irie(Univ. of Tokyo) / Takashi Miyoshi(Fujitsu) / Yuichiro Shibata(Nagasaki Univ.) / Kentaro Sano(RIKEN) / Mayumi Takeyama(Kitami Inst. of Tech.) / Makoto Nagata(Kobe Univ.) / Hideaki Kimata(NTT) / Kazuya Kodama(NII) |
Secretary | Nozomu Togawa(NTT) / Hiroshi Takahashi(Aizu Univ.) / Hidetsugu Irie(Tokyo Inst. of Tech.) / Takashi Miyoshi(Nihon Univ.) / Yuichiro Shibata(Utsunomiya Univ.) / Kentaro Sano(Hokkaido Univ.) / Mayumi Takeyama(Hiroshima City Univ.) / Makoto Nagata(e-trees.Japan) / Hideaki Kimata(Toyohashi Univ. of Tech.) / Kazuya Kodama(NTT) / (Panasonic) / (Tohoku Univ.) / (KDDI Research) |
Assistant | / / Yasuaki Ito(Hiroshima Univ.) / Tomoaki Tsumura(Nagoya Inst. of Tech.) / Yuuki Kobayashi(NEC) / Hiroki Nakahara(Tokyo Inst. of Tech.) / Yasuo Kimura(Tokyo Univ. of Tech.) / Hideki Nakazawa(Hirosaki Univ.) / Tomoaki Terasako(Ehime Univ.) / Hiroyuki Ito(Tokyo Inst. of Tech.) / Masatoshi Tsuge(Socionext) / Tetsuya Hirose(Kobe Univ.) / Kazuya Hayase(NTT) / Yasutaka Matsuo(NHK) / Hiroe Iwasaki(NTT) |
Paper Information | |
Registration To | Technical Committee on VLSI Design Technologies / Technical Committee on Dependable Computing / Technical Committee on Computer Systems / Technical Committee on Reconfigurable Systems / Technical Committee on Component Parts and Materials / Technical Committee on Integrated Circuits and Devices / Technical Committee on Image Engineering / Special Interest Group on System and LSI Design Methodology / Special Interest Group on Embedded Systems / Special Interest Group on System Architecture |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Flip-Flops with different retention characteristics for process variation estimation |
Sub Title (in English) | |
Keyword(1) | Variation |
Keyword(2) | Flip-Flop |
1st Author's Name | Kento Fukazawa |
1st Author's Affiliation | Saitama University(Saitama Univ.) |
2nd Author's Name | Shinichi Nishizawa |
2nd Author's Affiliation | Saitama University(Saitama Univ.) |
3rd Author's Name | Kazuhito Ito |
3rd Author's Affiliation | Saitama University(Saitama Univ.) |
Date | 2018-12-07 |
Paper # | VLD2018-66,DC2018-52 |
Volume (vol) | vol.118 |
Number (no) | VLD-334,DC-335 |
Page | pp.pp.189-193(VLD), pp.189-193(DC), |
#Pages | 5 |
Date of Issue | 2018-11-28 (VLD, DC) |