| Presentation | 2018-12-07 Process Variation-aware Model-based OPC using 0-1 Quadratic Programming Rina Azuma, Yukihide Kohira, Tomomi Matsui, Atsushi Takahashi, Chikaaki Kodama, Shigeki Nojima, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Due to continuous shrinking of Critical Dimensions (CD) of layout pattern in VLSI, advances of manufacturing process in optical lithography are required. As a main stream among resolution enhancement techniques, Optical Proximity Correction (OPC), which improves shape ?delity of formed patterns on wafers against designed target patterns by mask correction, is essential to achieve scale down of CD in the optical lithography. In general, mask correction methods in OPC are classi?ed into two classes: rule-based OPC and model-based OPC. Recently, model-based OPC is broadly studied. In this paper, we propose a model-based OPC which formulates the maximization of contrast of intensity around edges of target patterns as 0-1 Quadratic Programming, and which is solved by using Forcing Rule, Gradient Midpoint Method or Gradient Deciding Method. By these proposed methods, shape ?delity and tolerance against process variation are improved simultaneously. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | lithography / lithography simulation / optical proximity correction (OPC) / design for manufacturability (DFM) |
| Paper # | VLD2018-70,DC2018-56 |
| Date of Issue | 2018-11-28 (VLD, DC) |
| Conference Information | |
| Committee | VLD / DC / CPSY / RECONF / CPM / ICD / IE / IPSJ-SLDM / IPSJ-EMB / IPSJ-ARC |
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| Conference Date | 2018/12/5(3days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Satellite Campus Hiroshima |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Design Gaia 2018 -New Field of VLSI Design- |
| Chair | Noriyuki Minegishi(Mitsubishi Electric) / Satoshi Fukumoto(Tokyo Metropolitan Univ.) / Koji Nakano(Hiroshima Univ.) / Masato Motomura(Hokkaido Univ.) / Fumihiko Hirose(Yamagata Univ.) / Hideto Hidaka(Renesas) / Takayuki Hamamoto(Tokyo Univ. of Science) / Yutaka Tamiya(Fujitsu Laboratories) / 渡辺 晴美(東海大) / 井上 弘士(九大) |
| Vice Chair | Nozomu Togawa(Waseda Univ.) / Hiroshi Takahashi(Ehime Univ.) / Hidetsugu Irie(Univ. of Tokyo) / Takashi Miyoshi(Fujitsu) / Yuichiro Shibata(Nagasaki Univ.) / Kentaro Sano(RIKEN) / Mayumi Takeyama(Kitami Inst. of Tech.) / Makoto Nagata(Kobe Univ.) / Hideaki Kimata(NTT) / Kazuya Kodama(NII) |
| Secretary | Nozomu Togawa(NTT) / Hiroshi Takahashi(Aizu Univ.) / Hidetsugu Irie(Tokyo Inst. of Tech.) / Takashi Miyoshi(Nihon Univ.) / Yuichiro Shibata(Utsunomiya Univ.) / Kentaro Sano(Hokkaido Univ.) / Mayumi Takeyama(Hiroshima City Univ.) / Makoto Nagata(e-trees.Japan) / Hideaki Kimata(Toyohashi Univ. of Tech.) / Kazuya Kodama(NTT) / (Panasonic) / (Tohoku Univ.) / (KDDI Research) |
| Assistant | / / Yasuaki Ito(Hiroshima Univ.) / Tomoaki Tsumura(Nagoya Inst. of Tech.) / Yuuki Kobayashi(NEC) / Hiroki Nakahara(Tokyo Inst. of Tech.) / Yasuo Kimura(Tokyo Univ. of Tech.) / Hideki Nakazawa(Hirosaki Univ.) / Tomoaki Terasako(Ehime Univ.) / Hiroyuki Ito(Tokyo Inst. of Tech.) / Masatoshi Tsuge(Socionext) / Tetsuya Hirose(Kobe Univ.) / Kazuya Hayase(NTT) / Yasutaka Matsuo(NHK) / Hiroe Iwasaki(NTT) |
| Paper Information | |
| Registration To | Technical Committee on VLSI Design Technologies / Technical Committee on Dependable Computing / Technical Committee on Computer Systems / Technical Committee on Reconfigurable Systems / Technical Committee on Component Parts and Materials / Technical Committee on Integrated Circuits and Devices / Technical Committee on Image Engineering / Special Interest Group on System and LSI Design Methodology / Special Interest Group on Embedded Systems / Special Interest Group on System Architecture |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Process Variation-aware Model-based OPC using 0-1 Quadratic Programming |
| Sub Title (in English) | |
| Keyword(1) | lithography |
| Keyword(2) | lithography simulation |
| Keyword(3) | optical proximity correction (OPC) |
| Keyword(4) | design for manufacturability (DFM) |
| 1st Author's Name | Rina Azuma |
| 1st Author's Affiliation | The University of Aizu(Univ. of Aizu) |
| 2nd Author's Name | Yukihide Kohira |
| 2nd Author's Affiliation | The University of Aizu(Univ. of Aizu) |
| 3rd Author's Name | Tomomi Matsui |
| 3rd Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
| 4th Author's Name | Atsushi Takahashi |
| 4th Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
| 5th Author's Name | Chikaaki Kodama |
| 5th Author's Affiliation | Toshiba Memory Corporation(TMC) |
| 6th Author's Name | Shigeki Nojima |
| 6th Author's Affiliation | Toshiba Memory Corporation(TMC) |
| Date | 2018-12-07 |
| Paper # | VLD2018-70,DC2018-56 |
| Volume (vol) | vol.118 |
| Number (no) | VLD-334,DC-335 |
| Page | pp.pp.209-214(VLD), pp.209-214(DC), |
| #Pages | 6 |
| Date of Issue | 2018-11-28 (VLD, DC) |