| Presentation | 2018-12-05 Improved Routing Method for Two Layer Self-Aligned Double Patterning Shoya Tamura, Kunihiro Fujiyoshi, |
|---|---|
| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Self-Aligned Double Patterning (SADP) enables us to fabricate fine wiring under ArF immersion lithography. However, when multi-layer routing is performed, vias have to be greatly thickened because techniques for manufacturing fine vias are immature. Therefore, we extended the channel routing method which can wire efficiently on the basis of the VH routing, and proposed a two-layer routing method corresponding to a significantly thick vias. In this method, x-coordinate of each via is determined by using the constraint graph so that the whole routing can be succeeded with a higher probability. We implemented the proposed method on a computer and confirmed its effectiveness. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Self-Aligned Double Patterning / VH Routing / Channel Routing |
| Paper # | VLD2018-45,DC2018-31 |
| Date of Issue | 2018-11-28 (VLD, DC) |
| Conference Information | |
| Committee | VLD / DC / CPSY / RECONF / CPM / ICD / IE / IPSJ-SLDM / IPSJ-EMB / IPSJ-ARC |
|---|---|
| Conference Date | 2018/12/5(3days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Satellite Campus Hiroshima |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Design Gaia 2018 -New Field of VLSI Design- |
| Chair | Noriyuki Minegishi(Mitsubishi Electric) / Satoshi Fukumoto(Tokyo Metropolitan Univ.) / Koji Nakano(Hiroshima Univ.) / Masato Motomura(Hokkaido Univ.) / Fumihiko Hirose(Yamagata Univ.) / Hideto Hidaka(Renesas) / Takayuki Hamamoto(Tokyo Univ. of Science) / Yutaka Tamiya(Fujitsu Laboratories) / 渡辺 晴美(東海大) / 井上 弘士(九大) |
| Vice Chair | Nozomu Togawa(Waseda Univ.) / Hiroshi Takahashi(Ehime Univ.) / Hidetsugu Irie(Univ. of Tokyo) / Takashi Miyoshi(Fujitsu) / Yuichiro Shibata(Nagasaki Univ.) / Kentaro Sano(RIKEN) / Mayumi Takeyama(Kitami Inst. of Tech.) / Makoto Nagata(Kobe Univ.) / Hideaki Kimata(NTT) / Kazuya Kodama(NII) |
| Secretary | Nozomu Togawa(NTT) / Hiroshi Takahashi(Aizu Univ.) / Hidetsugu Irie(Tokyo Inst. of Tech.) / Takashi Miyoshi(Nihon Univ.) / Yuichiro Shibata(Utsunomiya Univ.) / Kentaro Sano(Hokkaido Univ.) / Mayumi Takeyama(Hiroshima City Univ.) / Makoto Nagata(e-trees.Japan) / Hideaki Kimata(Toyohashi Univ. of Tech.) / Kazuya Kodama(NTT) / (Panasonic) / (Tohoku Univ.) / (KDDI Research) |
| Assistant | / / Yasuaki Ito(Hiroshima Univ.) / Tomoaki Tsumura(Nagoya Inst. of Tech.) / Yuuki Kobayashi(NEC) / Hiroki Nakahara(Tokyo Inst. of Tech.) / Yasuo Kimura(Tokyo Univ. of Tech.) / Hideki Nakazawa(Hirosaki Univ.) / Tomoaki Terasako(Ehime Univ.) / Hiroyuki Ito(Tokyo Inst. of Tech.) / Masatoshi Tsuge(Socionext) / Tetsuya Hirose(Kobe Univ.) / Kazuya Hayase(NTT) / Yasutaka Matsuo(NHK) / Hiroe Iwasaki(NTT) |
| Paper Information | |
| Registration To | Technical Committee on VLSI Design Technologies / Technical Committee on Dependable Computing / Technical Committee on Computer Systems / Technical Committee on Reconfigurable Systems / Technical Committee on Component Parts and Materials / Technical Committee on Integrated Circuits and Devices / Technical Committee on Image Engineering / Special Interest Group on System and LSI Design Methodology / Special Interest Group on Embedded Systems / Special Interest Group on System Architecture |
|---|---|
| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Improved Routing Method for Two Layer Self-Aligned Double Patterning |
| Sub Title (in English) | |
| Keyword(1) | Self-Aligned Double Patterning |
| Keyword(2) | VH Routing |
| Keyword(3) | Channel Routing |
| 1st Author's Name | Shoya Tamura |
| 1st Author's Affiliation | Tokyo University of Agriculture and Technology(TUAT) |
| 2nd Author's Name | Kunihiro Fujiyoshi |
| 2nd Author's Affiliation | Tokyo University of Agriculture and Technology(TUAT) |
| Date | 2018-12-05 |
| Paper # | VLD2018-45,DC2018-31 |
| Volume (vol) | vol.118 |
| Number (no) | VLD-334,DC-335 |
| Page | pp.pp.37-42(VLD), pp.37-42(DC), |
| #Pages | 6 |
| Date of Issue | 2018-11-28 (VLD, DC) |