| Presentation | 2018-11-01 Consideration of bilayer film with Zn and AZO deposited by sputtering method Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Koutaro Nagata, Nozomu Tsuboi, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | In order to preparation of Zn doped AZO film, deposition of AZO films on Zn films were attempted by dc magnetron sputtering method. As a result, when the substrate temperature was raised from the room temperature after Zn film was deposited on the glass substrate, a Zn film detached from a glass substrate. For this reason, it was difficulty that Zn doped AZO film was prepared by deposition of AZO films on Zn films. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | AZO / Zinc / Oxygen / Magnetron Sputtering |
| Paper # | CPM2018-45 |
| Date of Issue | 2018-10-25 (CPM) |
| Conference Information | |
| Committee | CPM / IEE-MAG |
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| Conference Date | 2018/11/1(2days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Machinaka campus Nagaoka |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Functional materials (semiconductors, magnetic materials, dielectric materials, transparent conductors, semiconductors, etc.) Thin film processes / materials / devices, etc. |
| Chair | Fumihiko Hirose(Yamagata Univ.) / Masahiro Yamaguchi(Tohoku Univ.) |
| Vice Chair | Mayumi Takeyama(Kitami Inst. of Tech.) / Gaku Ohara(Meiji Univ.) / Keiji Yamada(Toshiba) |
| Secretary | Mayumi Takeyama(Toyohashi Univ. of Tech.) / Gaku Ohara(NTT) / Keiji Yamada |
| Assistant | Yasuo Kimura(Tokyo Univ. of Tech.) / Hideki Nakazawa(Hirosaki Univ.) / Tomoaki Terasako(Ehime Univ.) |
| Paper Information | |
| Registration To | Technical Committee on Component Parts and Materials / Technical Meeting on Magnetics |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Consideration of bilayer film with Zn and AZO deposited by sputtering method |
| Sub Title (in English) | |
| Keyword(1) | AZO |
| Keyword(2) | Zinc |
| Keyword(3) | Oxygen |
| Keyword(4) | Magnetron Sputtering |
| 1st Author's Name | Hidehiko Shimizu |
| 1st Author's Affiliation | Niigata University(Niigata Univ.) |
| 2nd Author's Name | Haruo Iwano |
| 2nd Author's Affiliation | Niigata University(Niigata Univ.) |
| 3rd Author's Name | Takahiro Kawakami |
| 3rd Author's Affiliation | Niigata University(Niigata Univ.) |
| 4th Author's Name | Yasuo Fukushima |
| 4th Author's Affiliation | Niigata University(Niigata Univ.) |
| 5th Author's Name | Koutaro Nagata |
| 5th Author's Affiliation | Niigata University(Niigata Univ.) |
| 6th Author's Name | Nozomu Tsuboi |
| 6th Author's Affiliation | Niigata University(Niigata Univ.) |
| Date | 2018-11-01 |
| Paper # | CPM2018-45 |
| Volume (vol) | vol.118 |
| Number (no) | CPM-276 |
| Page | pp.pp.21-24(CPM), |
| #Pages | 4 |
| Date of Issue | 2018-10-25 (CPM) |