| Presentation | 2018-11-02 Thermal stability of silicon and nitrogen doped DLC thin films Hideki Nakazawa, Kazuki Nakamura, Hiroya Osanai, Haruto Koriyama, Yasuyuki Kobayashi, Yoshiharu Enta, Yushi Suzuki, Maki Suemitsu, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We have investigated the effects of post-annealing on the properties of silicon and nitrogen doped diamond-like carbon (Si-N-DLC) films, which were prepared by plasma-enhanced chemical vapor deposition using H_(2) as a dilution gas and compared the properties of the Si-N-DLC films with those of nitrogen doped DLC (N-DLC) films. We found that the clustering of sp^(2) carbon atoms was accelerated for the N-DLC films by post-annealing in a vacuum at a temperature of 420?C or above, whereas the sp^(2) C clustering was almost suppressed for the Si-N-DLC films. It was also found that the amount of bound hydrogen in the Si-N-DLC films obviously increased after annealing at temperatures of 420 to 490?C. The Si-N-DLC films had higher optical bands than the N-DLC films, and the optical band gap of the Si-N-DLC films remained almost unchanged after annealing even at 490?C. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Diamond-like carbon / Plasma-enhanced chemical vapor deposition / Silicon / Nitrogen / Post-annealing |
| Paper # | CPM2018-52 |
| Date of Issue | 2018-10-25 (CPM) |
| Conference Information | |
| Committee | CPM / IEE-MAG |
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| Conference Date | 2018/11/1(2days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Machinaka campus Nagaoka |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Functional materials (semiconductors, magnetic materials, dielectric materials, transparent conductors, semiconductors, etc.) Thin film processes / materials / devices, etc. |
| Chair | Fumihiko Hirose(Yamagata Univ.) / Masahiro Yamaguchi(Tohoku Univ.) |
| Vice Chair | Mayumi Takeyama(Kitami Inst. of Tech.) / Gaku Ohara(Meiji Univ.) / Keiji Yamada(Toshiba) |
| Secretary | Mayumi Takeyama(Toyohashi Univ. of Tech.) / Gaku Ohara(NTT) / Keiji Yamada |
| Assistant | Yasuo Kimura(Tokyo Univ. of Tech.) / Hideki Nakazawa(Hirosaki Univ.) / Tomoaki Terasako(Ehime Univ.) |
| Paper Information | |
| Registration To | Technical Committee on Component Parts and Materials / Technical Meeting on Magnetics |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Thermal stability of silicon and nitrogen doped DLC thin films |
| Sub Title (in English) | |
| Keyword(1) | Diamond-like carbon |
| Keyword(2) | Plasma-enhanced chemical vapor deposition |
| Keyword(3) | Silicon |
| Keyword(4) | Nitrogen |
| Keyword(5) | Post-annealing |
| 1st Author's Name | Hideki Nakazawa |
| 1st Author's Affiliation | Hirosaki University(Hirosaki Univ.) |
| 2nd Author's Name | Kazuki Nakamura |
| 2nd Author's Affiliation | Hirosaki University(Hirosaki Univ.) |
| 3rd Author's Name | Hiroya Osanai |
| 3rd Author's Affiliation | Hirosaki University(Hirosaki Univ.) |
| 4th Author's Name | Haruto Koriyama |
| 4th Author's Affiliation | Hirosaki University(Hirosaki Univ.) |
| 5th Author's Name | Yasuyuki Kobayashi |
| 5th Author's Affiliation | Hirosaki University(Hirosaki Univ.) |
| 6th Author's Name | Yoshiharu Enta |
| 6th Author's Affiliation | Hirosaki University(Hirosaki Univ.) |
| 7th Author's Name | Yushi Suzuki |
| 7th Author's Affiliation | Hirosaki University(Hirosaki Univ.) |
| 8th Author's Name | Maki Suemitsu |
| 8th Author's Affiliation | Tohoku University(Tohoku Univ.) |
| Date | 2018-11-02 |
| Paper # | CPM2018-52 |
| Volume (vol) | vol.118 |
| Number (no) | CPM-276 |
| Page | pp.pp.99-104(CPM), |
| #Pages | 6 |
| Date of Issue | 2018-10-25 (CPM) |