Presentation 2018-04-20
Low temperature atomic layer deposition of yttrium oxide using plasma excited humidified argon
Kentaro Saito, Kensaku Kanomata, Masanori Miura, Bashir A. Arima, Kubota Shigeru, Fumihiko Hirose,
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Abstract(in English)
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Keyword(in English)
Paper # ED2018-8
Date of Issue 2018-04-12 (ED)

Conference Information
Committee ED
Conference Date 2018/4/19(2days)
Place (in Japanese) (See Japanese page)
Place (in English)
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Chair Kunio Tsuda(Toshiba)
Vice Chair Michihiko Suhara(TMU)
Secretary Michihiko Suhara(New JRC)
Assistant Toshiyuki Oishi(Saga Univ.) / Tatsuya Iwata(TUT)

Paper Information
Registration To Technical Committee on Electron Devices
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Low temperature atomic layer deposition of yttrium oxide using plasma excited humidified argon
Sub Title (in English)
Keyword(1)
1st Author's Name Kentaro Saito
1st Author's Affiliation Yamagata University(Yamagata Univ.)
2nd Author's Name Kensaku Kanomata
2nd Author's Affiliation Yamagata University(Yamagata Univ.)
3rd Author's Name Masanori Miura
3rd Author's Affiliation Yamagata University(Yamagata Univ.)
4th Author's Name Bashir A. Arima
4th Author's Affiliation Yamagata University(Yamagata Univ.)
5th Author's Name Kubota Shigeru
5th Author's Affiliation Yamagata University(Yamagata Univ.)
6th Author's Name Fumihiko Hirose
6th Author's Affiliation Yamagata University(Yamagata Univ.)
Date 2018-04-20
Paper # ED2018-8
Volume (vol) vol.118
Number (no) ED-9
Page pp.pp.29-32(ED),
#Pages 4
Date of Issue 2018-04-12 (ED)