Presentation 2018-01-25
Thin Film Formation Mechanism of Hexagonal Boron Nitride on c-Plane Sapphire Substrates by Low Pressure CVD
Takumi Kawarazaki, Naoki Umehara, Tomoyasu Nakama, Hiroko Kominami, Kazuhiko Hara,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) The hexagonal boron nitride (h-BN) thin films were grown on a c-plane sapphire substrate by low pressure chemical vapor deposition using BCl3 and NH3 as sources. First, we investigated the effects of heating methods in order to suppress the gas phase reaction of sources. Next, in order to understand the influences of initial nucleation on the quality of the thin film, the situations of initial nucleation were investigated for the samples grown by changing the growth temperature and the supply rate of HN3 gas. We have found that the growth temperature influences the growth rate and density of nuclear, and the supply amount of NH3 influences the behavior of nucleation.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) hexagonal boron nitride / CVD / thin film / cathodoluminescence
Paper # EID2017-30
Date of Issue 2018-01-18 (EID)

Conference Information
Committee EID / ITE-IDY / IEIJ-SSL / SID-JC / IEE-EDD
Conference Date 2018/1/25(2days)
Place (in Japanese) (See Japanese page)
Place (in English) Shizuoka Univ., Hamamatsu
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair Yuko Kominami(Shizuoka Univ.) / Yoshihide Fujisaki(NHK)
Vice Chair Mutsumi Kimura(Ryukoku Univ.) / Rumiko Yamaguchi(Akita Univ.) / Munehiro Kimura(Nagaoka Univ. of Tech.)
Secretary Mutsumi Kimura(NTT) / Rumiko Yamaguchi(Tokyo Inst. of Tech.) / Munehiro Kimura(Shizuoka Univ.) / (Tohoku Univ.)
Assistant Hiroyuki Nitta(Japan Display) / Mitsuru Nakata(NHK) / Ryosuke Nonaka(Toshiba) / Takeshi Okuno(Huawei) / Tomokazu Shiga(Univ. of Electro-Comm.)

Paper Information
Registration To Technical Committee on Electronic Information Displays / Technical Group on Information Display / Division of Solid State Light Sources / Society for Information Display Japan Chapter / Technical Meeting on Electron Devices
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Thin Film Formation Mechanism of Hexagonal Boron Nitride on c-Plane Sapphire Substrates by Low Pressure CVD
Sub Title (in English)
Keyword(1) hexagonal boron nitride
Keyword(2) CVD
Keyword(3) thin film
Keyword(4) cathodoluminescence
1st Author's Name Takumi Kawarazaki
1st Author's Affiliation Shizuoka University(Shizuoka Univ.)
2nd Author's Name Naoki Umehara
2nd Author's Affiliation Shizuoka University(Shizuoka Univ.)
3rd Author's Name Tomoyasu Nakama
3rd Author's Affiliation Shizuoka University(Shizuoka Univ.)
4th Author's Name Hiroko Kominami
4th Author's Affiliation Shizuoka University(Shizuoka Univ.)
5th Author's Name Kazuhiko Hara
5th Author's Affiliation Shizuoka University(Shizuoka Univ.)
Date 2018-01-25
Paper # EID2017-30
Volume (vol) vol.117
Number (no) EID-411
Page pp.pp.1-4(EID),
#Pages 4
Date of Issue 2018-01-18 (EID)