Presentation	2018-01-25 Fabrication of Organic Thin Films on a Photosensitive Functional Gate Insulators and their TFT Characteristics Tasuku Endo, Chugen Hamachi, Ohno Ryuzou,
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Conference Information
Committee	EID / ITE-IDY / IEIJ-SSL / SID-JC / IEE-EDD
Conference Date	2018/1/25(2days)
Place (in Japanese)	(See Japanese page)
Place (in English)	Shizuoka Univ., Hamamatsu
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Chair	Yuko Kominami(Shizuoka Univ.) / Yoshihide Fujisaki(NHK)
Vice Chair	Mutsumi Kimura(Ryukoku Univ.) / Rumiko Yamaguchi(Akita Univ.) / Munehiro Kimura(Nagaoka Univ. of Tech.)
Secretary	Mutsumi Kimura(NTT) / Rumiko Yamaguchi(Tokyo Inst. of Tech.) / Munehiro Kimura(Shizuoka Univ.) / (Tohoku Univ.)
Assistant	Hiroyuki Nitta(Japan Display) / Mitsuru Nakata(NHK) / Ryosuke Nonaka(Toshiba) / Takeshi Okuno(Huawei) / Tomokazu Shiga(Univ. of Electro-Comm.)

Paper Information
Registration To	Technical Committee on Electronic Information Displays / Technical Group on Information Display / Division of Solid State Light Sources / Society for Information Display Japan Chapter / Technical Meeting on Electron Devices
Language	JPN
Title (in Japanese)	(See Japanese page)
Sub Title (in Japanese)	(See Japanese page)
Title (in English)	Fabrication of Organic Thin Films on a Photosensitive Functional Gate Insulators and their TFT Characteristics
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1st Author's Name	Tasuku Endo
1st Author's Affiliation	Tokyo University of Agriculture and Technology(TUAT)
2nd Author's Name	Chugen Hamachi
2nd Author's Affiliation	Tokyo University of Agriculture and Technology(TUAT)
3rd Author's Name	Ohno Ryuzou
3rd Author's Affiliation	JSR Corporation(JSR)
Date	2018-01-25
Paper #
Volume (vol)	vol.117
Number (no)	EID-411
Page	pp.pp.-(),
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