Presentation 2017-12-22
Three-dimension periodic nano-structure fabricated by proximity nano-patterning process (PnP)
Xudongfang Wang, Yasuaki Ishikawa, Shinji Araki, Yukiharu Uraoka, Seokwoo Jeon,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) In recent years, 3D periodic nanostructure have attracted considerable interest because of its excellent performance and can be a variety of applications such as phononic crystals. Large area, nanoshell-based 3D structures can be easily fabricated using a photoresist templating process. However, conventional nanostructures require a low-throughput process which is complicated and expensive process. One emerging solution to address this problem is called proximity field nanopatterning (PnP). The infiltration processes use liquid ZnO for a nanoshell-based 3D periodic structure with high structural flexibility and controllability. Consequently, clearly formed nanostructures were fabricated by using a photoresists called KMPR. Both of these could lead to further development toward nanoshell-based 3D structures for various applications.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Proximity field nanopatterning (PnP) / Three-dimensional (3D) / Nanoshell-based structure
Paper # EID2017-18,SDM2017-79
Date of Issue 2017-12-15 (EID, SDM)

Conference Information
Committee SDM / EID
Conference Date 2017/12/22(1days)
Place (in Japanese) (See Japanese page)
Place (in English) Kyoto University
Topics (in Japanese) (See Japanese page)
Topics (in English) Si, Si-related materials, device process, electron devices, and display technology
Chair Tatsuya Kunikiyo(Renesas) / Yuko Kominami(Shizuoka Univ.)
Vice Chair Takahiro Shinada(Tohoku Univ.) / Mutsumi Kimura(Ryukoku Univ.)
Secretary Takahiro Shinada(Tohoku Univ.) / Mutsumi Kimura(Renesas)
Assistant Hiroya Ikeda(Shizuoka Univ.) / Tetsu Morooka(TOSHIBA MEMORY) / Rumiko Yamaguchi(Akita Univ.) / Hiroyuki Nitta(Japan Display) / Mitsuru Nakata(NHK) / Ryosuke Nonaka(Toshiba) / Takeshi Okuno(Huawei) / Tomokazu Shiga(Univ. of Electro-Comm.)

Paper Information
Registration To Technical Committee on Silicon Device and Materials / Technical Committee on Electronic Information Displays
Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Three-dimension periodic nano-structure fabricated by proximity nano-patterning process (PnP)
Sub Title (in English)
Keyword(1) Proximity field nanopatterning (PnP)
Keyword(2) Three-dimensional (3D)
Keyword(3) Nanoshell-based structure
1st Author's Name Xudongfang Wang
1st Author's Affiliation Nara institute of Science and Technology university(NAIST)
2nd Author's Name Yasuaki Ishikawa
2nd Author's Affiliation Nara institute of Science and Technology university(NAIST)
3rd Author's Name Shinji Araki
3rd Author's Affiliation Nara institute of Science and Technology university(NAIST)
4th Author's Name Yukiharu Uraoka
4th Author's Affiliation Nara institute of Science and Technology university(NAIST)
5th Author's Name Seokwoo Jeon
5th Author's Affiliation Korea advanced institute of science and technology university(KAIST)
Date 2017-12-22
Paper # EID2017-18,SDM2017-79
Volume (vol) vol.117
Number (no) EID-372,SDM-373
Page pp.pp.35-38(EID), pp.35-38(SDM),
#Pages 4
Date of Issue 2017-12-15 (EID, SDM)