Presentation | 2017-12-22 Three-dimension periodic nano-structure fabricated by proximity nano-patterning process (PnP) Xudongfang Wang, Yasuaki Ishikawa, Shinji Araki, Yukiharu Uraoka, Seokwoo Jeon, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | In recent years, 3D periodic nanostructure have attracted considerable interest because of its excellent performance and can be a variety of applications such as phononic crystals. Large area, nanoshell-based 3D structures can be easily fabricated using a photoresist templating process. However, conventional nanostructures require a low-throughput process which is complicated and expensive process. One emerging solution to address this problem is called proximity field nanopatterning (PnP). The infiltration processes use liquid ZnO for a nanoshell-based 3D periodic structure with high structural flexibility and controllability. Consequently, clearly formed nanostructures were fabricated by using a photoresists called KMPR. Both of these could lead to further development toward nanoshell-based 3D structures for various applications. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Proximity field nanopatterning (PnP) / Three-dimensional (3D) / Nanoshell-based structure |
Paper # | EID2017-18,SDM2017-79 |
Date of Issue | 2017-12-15 (EID, SDM) |
Conference Information | |
Committee | SDM / EID |
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Conference Date | 2017/12/22(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | Kyoto University |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | Si, Si-related materials, device process, electron devices, and display technology |
Chair | Tatsuya Kunikiyo(Renesas) / Yuko Kominami(Shizuoka Univ.) |
Vice Chair | Takahiro Shinada(Tohoku Univ.) / Mutsumi Kimura(Ryukoku Univ.) |
Secretary | Takahiro Shinada(Tohoku Univ.) / Mutsumi Kimura(Renesas) |
Assistant | Hiroya Ikeda(Shizuoka Univ.) / Tetsu Morooka(TOSHIBA MEMORY) / Rumiko Yamaguchi(Akita Univ.) / Hiroyuki Nitta(Japan Display) / Mitsuru Nakata(NHK) / Ryosuke Nonaka(Toshiba) / Takeshi Okuno(Huawei) / Tomokazu Shiga(Univ. of Electro-Comm.) |
Paper Information | |
Registration To | Technical Committee on Silicon Device and Materials / Technical Committee on Electronic Information Displays |
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Language | ENG |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Three-dimension periodic nano-structure fabricated by proximity nano-patterning process (PnP) |
Sub Title (in English) | |
Keyword(1) | Proximity field nanopatterning (PnP) |
Keyword(2) | Three-dimensional (3D) |
Keyword(3) | Nanoshell-based structure |
1st Author's Name | Xudongfang Wang |
1st Author's Affiliation | Nara institute of Science and Technology university(NAIST) |
2nd Author's Name | Yasuaki Ishikawa |
2nd Author's Affiliation | Nara institute of Science and Technology university(NAIST) |
3rd Author's Name | Shinji Araki |
3rd Author's Affiliation | Nara institute of Science and Technology university(NAIST) |
4th Author's Name | Yukiharu Uraoka |
4th Author's Affiliation | Nara institute of Science and Technology university(NAIST) |
5th Author's Name | Seokwoo Jeon |
5th Author's Affiliation | Korea advanced institute of science and technology university(KAIST) |
Date | 2017-12-22 |
Paper # | EID2017-18,SDM2017-79 |
Volume (vol) | vol.117 |
Number (no) | EID-372,SDM-373 |
Page | pp.pp.35-38(EID), pp.35-38(SDM), |
#Pages | 4 |
Date of Issue | 2017-12-15 (EID, SDM) |