Presentation 2017-12-22
Light trapping effect of nanoimprinted texture for thin crystalline silicon solar cell
Nakai Yuya, Ishikawa Yasuaki, Uraoka Yukiharu,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) For the purpose of the realization of thin-type crystal silicon solar cells, a light trapping effect in a light absorption layer is important, and forming a texture structure for the purpose of multiple reflection of light is necessary. Our group put focus on the nanoimprinting method as the texture forming method. In this report, the absorption rate by optical simulation was evaluated for the combination of the surface and rear texture alone and the combination of the surface / rear texture. As a result, the combination of surface-rear texture with the micron scale tended to increase the absorption rate compared with single side texture. In addition, from the light absorption distribution, spots region that strongly absorb light in the medium and long wavelength region were confirmed. From these results, it is considered that the combination of surface/ rear texture on the micron scale is effective for the light trapping structure of thin-type crystal silicon solar cells.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Solar cell / Light trapping / Texture / Nanoimprint lithography / Optical simulation
Paper # EID2017-11,SDM2017-72
Date of Issue 2017-12-15 (EID, SDM)

Conference Information
Committee SDM / EID
Conference Date 2017/12/22(1days)
Place (in Japanese) (See Japanese page)
Place (in English) Kyoto University
Topics (in Japanese) (See Japanese page)
Topics (in English) Si, Si-related materials, device process, electron devices, and display technology
Chair Tatsuya Kunikiyo(Renesas) / Yuko Kominami(Shizuoka Univ.)
Vice Chair Takahiro Shinada(Tohoku Univ.) / Mutsumi Kimura(Ryukoku Univ.)
Secretary Takahiro Shinada(Tohoku Univ.) / Mutsumi Kimura(Renesas)
Assistant Hiroya Ikeda(Shizuoka Univ.) / Tetsu Morooka(TOSHIBA MEMORY) / Rumiko Yamaguchi(Akita Univ.) / Hiroyuki Nitta(Japan Display) / Mitsuru Nakata(NHK) / Ryosuke Nonaka(Toshiba) / Takeshi Okuno(Huawei) / Tomokazu Shiga(Univ. of Electro-Comm.)

Paper Information
Registration To Technical Committee on Silicon Device and Materials / Technical Committee on Electronic Information Displays
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Light trapping effect of nanoimprinted texture for thin crystalline silicon solar cell
Sub Title (in English)
Keyword(1) Solar cell
Keyword(2) Light trapping
Keyword(3) Texture
Keyword(4) Nanoimprint lithography
Keyword(5) Optical simulation
1st Author's Name Nakai Yuya
1st Author's Affiliation Nara Institute of Science and Technology(NAIST)
2nd Author's Name Ishikawa Yasuaki
2nd Author's Affiliation Nara Institute of Science and Technology(NAIST)
3rd Author's Name Uraoka Yukiharu
3rd Author's Affiliation Nara Institute of Science and Technology(NAIST)
Date 2017-12-22
Paper # EID2017-11,SDM2017-72
Volume (vol) vol.117
Number (no) EID-372,SDM-373
Page pp.pp.1-4(EID), pp.1-4(SDM),
#Pages 4
Date of Issue 2017-12-15 (EID, SDM)