| Presentation | 2017-07-22 [Invited Talk] Development of Low Damage Facing Target Sputter-deposition Processes Yoichi Hoshi, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | About 43 years ago, I firstly challenged the deposition of YIG films by using a conventional sputtering system. Deposition of stoichiometric YIG films was a difficult challenge since high energy negative oxygen ions and secondary electrons emitted from target surface bombard the substrate surface during deposition. In order to realize high rate sputter-deposition of YIG film, I studied sputtering phenomena and invented Facing-Target sputtering method in which substrate bombardment of negative oxygen ions and secondary electrons were completely suppressed. Recently, low damage sputter-deposition process using the Facing-Target sputtering method has been developed for organic devices. In this paper, history of the low damage sputter-deposition process for the formation of top electrode films in OLED will be explained. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Facing-Traget sputtering / negative oxygen ion / secondary electron / OLED / low damage sputtering |
| Paper # | CPM2017-38 |
| Date of Issue | 2017-07-14 (CPM) |
| Conference Information | |
| Committee | CPM |
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| Conference Date | 2017/7/21(2days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | Fumihiko Hirose(Yamagata Univ.) |
| Vice Chair | Mayumi Takeyama(Kitami Inst. of Tech.) |
| Secretary | Mayumi Takeyama(Nihon Univ.) |
| Assistant | Yuichi Akage(NTT) |
| Paper Information | |
| Registration To | Technical Committee on Component Parts and Materials |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | [Invited Talk] Development of Low Damage Facing Target Sputter-deposition Processes |
| Sub Title (in English) | |
| Keyword(1) | Facing-Traget sputtering |
| Keyword(2) | negative oxygen ion |
| Keyword(3) | secondary electron |
| Keyword(4) | OLED |
| Keyword(5) | |
| Keyword(6) | low damage sputtering |
| 1st Author's Name | Yoichi Hoshi |
| 1st Author's Affiliation | Tokyo Polytechnic University(Tokyo Polytechnic Univ.) |
| Date | 2017-07-22 |
| Paper # | CPM2017-38 |
| Volume (vol) | vol.117 |
| Number (no) | CPM-148 |
| Page | pp.pp.89-94(CPM), |
| #Pages | 6 |
| Date of Issue | 2017-07-14 (CPM) |